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Year of Publication 16.08.2016
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Year of Publication 17.07.2018
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Processing System Containing An Isolation Region separating a Deposition chamber from a treatment chamber
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Year of Publication 18.05.2016
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Year of Publication 11.02.2015
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Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in plasma enhanced chemical vapor deposition system
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Year of Publication 19.04.2017
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Electrostatic chuck assembly
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Year of Publication 04.12.2013
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Year of Publication 04.12.2013
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Loadlock integrated bevel etcher system
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Year of Publication 01.04.2017
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Year of Publication 01.04.2017
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Static deposition profile modulation for linear plasma source
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Year of Publication 26.11.2014
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Year of Publication 26.11.2014
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Tandem process chamber
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Year of Publication 21.10.2003
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Year of Publication 21.10.2003
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Tandem process chamber
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Year of Publication 21.10.2003
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Year of Publication 21.10.2003
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LARGE AREA SOURCE FOR UNIFORM ELECTRON BEAM GENERATION
ZHAO, JUN, LIVESAY, WILLIAM, R, WOODS, SCOTT, C, PONNEKANTI, HARI, K, ARMER, HELEN, R, DEMOS, ALEXANDROS, T
Year of Publication 14.04.2005
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Year of Publication 14.04.2005
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