Sol–gel matrix for YAG:Ce phosphors in pc-LEDs
Kräuter, Gertrud, Eberhardt, Angela, Peskoller, Florian, Güldal, Nusret Sena, Lell, Alfred, Ritasalo, Riina, Pilvi, Tero, Römer, Manfred, Domann, Gerhard, Löbmann, Peer
Published in Journal of sol-gel science and technology (01.02.2021)
Published in Journal of sol-gel science and technology (01.02.2021)
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Journal Article
ALD of YF3 Thin Films from TiF4 and Y(thd)3 Precursors
Pilvi, Tero, Puukilainen, Esa, Munnik, Frans, Leskelä, Markku, Ritala, Mikko
Published in Chemical vapor deposition (01.03.2009)
Published in Chemical vapor deposition (01.03.2009)
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Journal Article
Evaluation of a Praseodymium Precursor for Atomic Layer Deposition of Oxide Dielectric Films
Kukli, Kaupo, Ritala, Mikko, Pilvi, Tero, Sajavaara, Timo, Leskelä, Markku, Jones, Anthony C., Aspinall, Helen C., Gilmer, David C., Tobin, Philip J.
Published in Chemistry of materials (30.11.2004)
Published in Chemistry of materials (30.11.2004)
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Journal Article
Free-standing inductive grid filter for infrared radiation rejection
Jefimovs, Konstantins, Laukkanen, Janne, Vallius, Tuomas, Pilvi, Tero, Ritala, Mikko, Meilahti, Tomi, Kaipiainen, Matti, Bavdaz, Marcos, Leskelä, Markku, Turunen, Jari
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Novel ALD Process for Depositing CaF2 Thin Films
Pilvi, Tero, Arstila, Kai, Leskelä, Markku, Ritala, Mikko
Published in Chemistry of materials (10.07.2007)
Published in Chemistry of materials (10.07.2007)
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Journal Article
Advanced thin film technology for ultrahigh resolution X-ray microscopy
Vila-Comamala, Joan, Jefimovs, Konstantins, Raabe, Jörg, Pilvi, Tero, Fink, Rainer H., Senoner, Mathias, Maaßdorf, Andre, Ritala, Mikko, David, Christian
Published in Ultramicroscopy (01.10.2009)
Published in Ultramicroscopy (01.10.2009)
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Journal Article
Atomic Layer Deposition of MgF2 Thin Films Using TaF5 as a Novel Fluorine Source
Pilvi, Tero, Puukilainen, Esa, Kreissig, Ulrich, Leskelä, Markku, Ritala, Mikko
Published in Chemistry of materials (12.08.2008)
Published in Chemistry of materials (12.08.2008)
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Journal Article
Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water
Kukli, Kaupo, Pilvi, Tero, Ritala, Mikko, Sajavaara, Timo, Lu, Jun, Leskelä, Markku
Published in Thin solid films (22.11.2005)
Published in Thin solid films (22.11.2005)
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Journal Article
Atomic Layer Deposition of MgF 2 Thin Films Using TaF 5 as a Novel Fluorine Source
Pilvi, Tero, Puukilainen, Esa, Kreissig, Ulrich, Leskelä, Markku, Ritala, Mikko
Published in Chemistry of materials (01.08.2008)
Published in Chemistry of materials (01.08.2008)
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Journal Article
Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors
Pilvi, Tero, Puukilainen, Esa, Arstila, Kai, Leskelä, Markku, Ritala, Mikko
Published in Chemical vapor deposition (01.04.2008)
Published in Chemical vapor deposition (01.04.2008)
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Journal Article
New octahedral Ta(V) hydrazido-substituted compounds for atomic layer deposition: Syntheses, X-ray diffraction structures of TaCl(NMe 2) 3[N(TMS)NMe 2] and Ta(NMe 2) 4[N(TMS)NMe 2], and fluxional behavior of the amido and hydrazido ligands in solution
Huang, Shih-Huang, Pilvi, Tero, Wang, Xiaoping, Leskelä, Markku, Richmond, Michael G.
Published in Polyhedron (10.05.2010)
Published in Polyhedron (10.05.2010)
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Journal Article
Novel ALD Process for Depositing CaF 2 Thin Films
Pilvi, Tero, Arstila, Kai, Leskelä, Markku, Ritala, Mikko
Published in Chemistry of materials (01.07.2007)
Published in Chemistry of materials (01.07.2007)
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Journal Article
New octahedral Ta(V) hydrazido-substituted compounds for atomic layer deposition: Syntheses, X-ray diffraction structures of TaCl(NMe2)(3)[N(TMS)NMe2] and Ta(NMe2)(4)[N(TMS)NMe2], and fluxional behavior of the amido and hydrazido ligands in solution
Huang, Shih-Huang, Pilvi, Tero, Wang, Xiaoping, Leskela, Markku, Richmond, Michael G.
Published in Polyhedron (10.05.2010)
Published in Polyhedron (10.05.2010)
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Journal Article
ALD of YF 3 Thin Films from TiF 4 and Y(thd) 3 Precursors
Pilvi, Tero, Puukilainen, Esa, Munnik, Frans, Leskelä, Markku, Ritala, Mikko
Published in Chemical vapor deposition (01.03.2009)
Published in Chemical vapor deposition (01.03.2009)
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Journal Article