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Published in Ultramicroscopy (2010)
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Atomic Layer Deposition of LaF 3 Thin Films using La(thd) 3 and TiF 4 as Precursors
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Published in Chemical vapor deposition (01.04.2008)
Published in Chemical vapor deposition (01.04.2008)
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Published in Materials science & engineering. B, Solid-state materials for advanced technology (25.04.2005)
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Picosun SUNALE ALD Systems for High Quality Nanocoatings - Bridging the Gap between R&D and Industrial Production
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Published in ECS transactions (01.01.2011)
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(MeCp)Ir(CHD) and molecular oxygen as precursors in atomic layer deposition of iridiumCCDC reference number 767385. For crystallographic data in CIF or other electronic format see DOI: 10.1039/c0jm00486c
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Year of Publication 31.08.2010
Year of Publication 31.08.2010
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Journal Article
Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates
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Published in Materials science & engineering. B, Solid-state materials for advanced technology (25.04.2005)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (25.04.2005)
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