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Year of Publication 20.04.2012
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MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY COMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE
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Year of Publication 06.03.2012
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Optical element and optical arrangement therewith
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Year of Publication 21.07.2019
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MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY COMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE
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Year of Publication 28.02.2018
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DODOC AURELIAN, ZACZEK CHRISTOPH, BRAUN GERHARD, PAUL HANS-JOCHEN, MANN HANS-JUERGEN, MIGURA SASCHA
Year of Publication 17.11.2015
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Year of Publication 17.11.2015
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