The Limits of Lamellae-Forming PS‑b‑PMMA Block Copolymers for Lithography
Wan, Lei, Ruiz, Ricardo, Gao, He, Patel, Kanaiyalal C, Albrecht, Thomas R, Yin, Jian, Kim, Jihoon, Cao, Yi, Lin, Guanyang
Published in ACS nano (28.07.2015)
Published in ACS nano (28.07.2015)
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Journal Article
Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance
Albrecht, Thomas R., Arora, Hitesh, Ayanoor-Vitikkate, Vipin, Beaujour, Jean-Marc, Bedau, Daniel, Berman, David, Bogdanov, Alexei L., Chapuis, Yves-Andre, Cushen, Julia, Dobisz, Elizabeth E., Doerk, Gregory, He Gao, Grobis, Michael, Gurney, Bruce, Hanson, Weldon, Hellwig, Olav, Hirano, Toshiki, Jubert, Pierre-Olivier, Kercher, Dan, Lille, Jeffrey, Zuwei Liu, Mate, C. Mathew, Obukhov, Yuri, Patel, Kanaiyalal C., Rubin, Kurt, Ruiz, Ricardo, Schabes, Manfred, Lei Wan, Weller, Dieter, Tsai-Wei Wu, En Yang
Published in IEEE transactions on magnetics (01.05.2015)
Published in IEEE transactions on magnetics (01.05.2015)
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Journal Article
Bit Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance
Albrecht, Thomas R, Arora, Hitesh, Ayanoor-Vitikkate, Vipin, Beaujour, Jean-Marc, Bedau, Daniel, Berman, David, Bogdanov, Alexei L, Yves-Andre Chapuis, Cushen, Julia, Dobisz, Elizabeth E, Doerk, Gregory, Gao, He, Grobis, Michael, Gurney, Bruce, Hanson, Weldon, Hellwig, Olav, Hirano, Toshiki, Pierre-Olivier Jubert, Kercher, Dan, Lille, Jeffrey, Liu, Zuwei, C Mathew Mate, Obukhov, Yuri, Patel, Kanaiyalal C, Rubin, Kurt, Ruiz, Ricardo, Schabes, Manfred, Wan, Lei, Weller, Dieter, Tsai-Wei, Wu, Yan, En
Published in arXiv.org (19.03.2015)
Published in arXiv.org (19.03.2015)
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Journal Article
Method for manufacturing a magnetic read sensor with narrow track width using amorphous carbon as a hard mask and localized CMP
YUAN SAMUEL W, PATEL KANAIYALAL C, KATINE JORDAN A, ROBERTSON NEIL L, BRAGANCA PATRICK M, LI JUI-LUNG, BALAMANE HAMID, LI YANG
Year of Publication 31.12.2013
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Year of Publication 31.12.2013
Patent
METHOD FOR MANUFACTURING A MAGNETIC READ SENSOR WITH NARROW TRACK WIDTH USING AMORPHOUS CARBON AS A HARD MASK AND LOCALIZED CMP
YUAN SAMUEL W, PATEL KANAIYALAL C, KATINE JORDAN A, ROBERTSON NEIL L, BRAGANCA PATRICK M, LI JUI-LUNG, BALAMANE HAMID, LI YANG
Year of Publication 18.04.2013
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Year of Publication 18.04.2013
Patent