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Kolloidchemische und grenzflächenphysikalische Aspekte bei der Entwicklung von Kupfer-CMP-Slurries

Kolloidchemische und grenzflächenphysikalische Aspekte bei der Entwicklung von Kupfer-CMP-Slurries

by Nennemann, A., Krüger, L., Puppe, L., Passing, G., Hey, G., Kirchmeyer, S.
Published in Chemie ingenieur technik (01.02.2005)

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Journal Article

PROCESS FOR PRODUCING ELECTROLYTIC CAPACITORS HAVING A LOW LEAKAGE CURRENT

PROCESS FOR PRODUCING ELECTROLYTIC CAPACITORS HAVING A LOW LEAKAGE CURRENT

by KARABULUT HIKMET, PASSING GERD, MERKER UDO, REUTER KNUD
Year of Publication 02.06.2011

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Patent

PROCESS FOR PRODUCING ELECTROLYTIC CAPACITORS HAVING A LOW LEAKAGE CURRENT

PROCESS FOR PRODUCING ELECTROLYTIC CAPACITORS HAVING A LOW LEAKAGE CURRENT

by KARABULUT, HIKMET, PASSING, GERD, REUTER, KNUD, MERKER, UDO
Year of Publication 23.02.2011

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Patent

PROCESS FOR SEPARATING ZIRCONIUM AND HAFNIUM

PROCESS FOR SEPARATING ZIRCONIUM AND HAFNIUM

by PASSING GERD, KIRCHMEYER STEPHAN, REUTER KNUD
Year of Publication 13.12.2007

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Patent

PROCESS FOR SEPARATING ZIRCONIUM AND HAFNIUM

PROCESS FOR SEPARATING ZIRCONIUM AND HAFNIUM

by PASSING GERD, KIRCHMEYER STEPHAN, REUTER KNUD
Year of Publication 29.11.2007

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Patent

METHOD FOR SEPARATING ZIRCONIUM AND HAFNIUM

METHOD FOR SEPARATING ZIRCONIUM AND HAFNIUM

by PASSING GERD, KIRCHMEYER STEPHAN, REUTER KNUD
Year of Publication 15.11.2007

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Patent

Method for separating zirconium and hafnium

Method for separating zirconium and hafnium

by KIRCHMEYER, STEPHAN, PASSING, GERD, REUTER, KNUD
Year of Publication 14.11.2007

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Patent

$Separation of zirconium- and hafnium compound comprises subjecting a mixture containing hafnium compound and zirconium compound to fractional crystallization$

Separation of zirconium- and hafnium compound comprises subjecting a mixture containing hafnium compound and zirconium compound to fractional crystallization

by KIRCHMEYER, STEPHAN, PASSING, GERD, REUTER, KNUD
Year of Publication 08.11.2007

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Patent

PROCESS FOR SEPARATING ZIRCONIUN AND HAFNIUM

PROCESS FOR SEPARATING ZIRCONIUN AND HAFNIUM

by PASSING GERD, KIRCHMEYER STEPHAN, REUTER KNUD
Year of Publication 07.11.2007

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Patent

PROCESS FOR PRODUCING ELECTROLYTIC CAPACITORS HAVING A LOW LEAKAGE CURRENT

PROCESS FOR PRODUCING ELECTROLYTIC CAPACITORS HAVING A LOW LEAKAGE CURRENT

by KARABULUT, HIKMET, PASSING, GERD, REUTER, KNUD, MERKER, UDO
Year of Publication 01.04.2010

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Patent

Silicon boronitride ceramic powder is produced

Silicon boronitride ceramic powder is produced

by VOGT, KRISTINA, PASSING, GERD
Year of Publication 28.10.1999

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Patent

PROCESS FOR PRODUCING ELECTROLYTIC CAPACITORS HAVING A LOW LEAKAGE CURRENT

PROCESS FOR PRODUCING ELECTROLYTIC CAPACITORS HAVING A LOW LEAKAGE CURRENT

by KARABULUT, HIKMET, PASSING, GERD, REUTER, KNUD, MERKER, UDO
Year of Publication 10.12.2009

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Patent

Evaluation of MOCVD Grown Niobium Nitride Films as Gate Electrode for Advanced CMOS Technology

Evaluation of MOCVD Grown Niobium Nitride Films as Gate Electrode for Advanced CMOS Technology

by Thiede, Tobias, Parala, Harish, Reuter, Knud, Passing, Gerd, Kirchmeyer, Stephan, Hinz, Jörn, Lemberger, Martin, Bauer, Anton, Fischer, Roland
Published in Meeting abstracts (Electrochemical Society) (29.08.2008)

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Journal Article

HIGH SELECTIVITY COLLOIDAL SILICA SLURRY

HIGH SELECTIVITY COLLOIDAL SILICA SLURRY

by PUPPE, LOTHER, PASSING, GERD W, BELOV, IRINA
Year of Publication 29.06.2005

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Patent

HIGH SELECTIVITY COLLOIDAL SILICA SLURRY

HIGH SELECTIVITY COLLOIDAL SILICA SLURRY

by PUPPE LOTHAR, PASSING GERD W, BELOV IRINA
Year of Publication 16.06.2005

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Patent

High selectivity colloidal silica slurry

High selectivity colloidal silica slurry

by PUPPE, LOTHAR, PASSING, GERD, BELOV, IRINA
Year of Publication 15.06.2005

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Patent

HIGH SELECTIVITY COLLOIDAL SILICA SLURRY

HIGH SELECTIVITY COLLOIDAL SILICA SLURRY

by PUPPE, LOTHAR, PASSING, GERD W, BELOV, IRINA
Year of Publication 25.05.2005

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Patent

METHOD TO MAKE ELECTROLYTIC CAPACITORS WITH LOW LEAKAGE CURRENT

METHOD TO MAKE ELECTROLYTIC CAPACITORS WITH LOW LEAKAGE CURRENT

by KARABULUT KHIKMET, PASSING GERD, ROJTER KNUD, MERKER UDO
Year of Publication 10.03.2015

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Patent

POLISHING SLURRY FOR THE CHEMICAL-MECHANICAL POLISHING OF METAL AND DIELECTRIC STRUCTURES

POLISHING SLURRY FOR THE CHEMICAL-MECHANICAL POLISHING OF METAL AND DIELECTRIC STRUCTURES

by MING-SHIH TSAI, GERD PASSING, KRISTINA VOGT
Year of Publication 28.01.2005

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Patent

Nanoparticulate, redispersible zinc oxide gels

Nanoparticulate, redispersible zinc oxide gels

by PASSING, GERD, WOMELSDORF, HERMANN-JENS, HOHEISEL, WERNER
Year of Publication 21.12.2004

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Patent

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