Search Results - "PARK HYUK MIN" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Review of defect chemistry in fluorite-structure ferroelectrics for future electronic devices

Review of defect chemistry in fluorite-structure ferroelectrics for future electronic devices

by Park, Min Hyuk, Lee, Dong Hyun, Yang, Kun, Park, Ju-Yong, Yu, Geun Taek, Park, Hyeon Woo, Materano, Monica, Mittmann, Terence, Lomenzo, Patrick D, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (01.01.2020)

Get full text

Journal Article

Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors

Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors

by Mikolajick, Thomas, Slesazeck, Stefan, Park, Min Hyuk, Schroeder, Uwe
Published in MRS bulletin (01.05.2018)

Get full text

Journal Article

Review and perspective on ferroelectric HfO2-based thin films for memory applications

Review and perspective on ferroelectric HfO2-based thin films for memory applications

by Park, Min Hyuk, Lee, Young Hwan, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong
Published in MRS communications (01.09.2018)

Get full text

Journal Article

Understanding ferroelectric phase formation in doped HfO2 thin films based on classical nucleation theory

Understanding ferroelectric phase formation in doped HfO2 thin films based on classical nucleation theory

by Park, Min Hyuk, Lee, Young Hwan, Hwang, Cheol Seong
Published in Nanoscale (07.11.2019)

Get full text

Journal Article

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

by Park, Min Hyuk, Lee, Young Hwan, Kim, Han Joon, Kim, Yu Jin, Moon, Taehwan, Kim, Keum Do, Müller, Johannes, Kersch, Alfred, Schroeder, Uwe, Mikolajick, Thomas, Hwang, Cheol Seong
Published in Advanced materials (Weinheim) (18.03.2015)

Get full text

Journal Article

Temporary formation of highly conducting domain walls for non-destructive read-out of ferroelectric domain-wall resistance switching memories

Temporary formation of highly conducting domain walls for non-destructive read-out of ferroelectric domain-wall resistance switching memories

by Jiang, Jun, Bai, Zi Long, Chen, Zhi Hui, He, Long, Zhang, David Wei, Zhang, Qing Hua, Shi, Jin An, Park, Min Hyuk, Scott, James F, Hwang, Cheol Seong, Jiang, An Quan
Published in Nature materials (01.01.2018)

Get full text

Journal Article

Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment

Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment

by Park, Min Hyuk, Lee, Young Hwan, Kim, Han Joon, Schenk, Tony, Lee, Woongkyu, Kim, Keum Do, Fengler, Franz P G, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong
Published in Nanoscale (28.07.2017)

Get full text

Journal Article

Improved Ferroelectric Switching Endurance of La-Doped Hf0.5Zr0.5O2 Thin Films

Improved Ferroelectric Switching Endurance of La-Doped Hf0.5Zr0.5O2 Thin Films

by Chernikova, Anna G, Kozodaev, Maxim G, Negrov, Dmitry V, Korostylev, Evgeny V, Park, Min Hyuk, Schroeder, Uwe, Hwang, Cheol Seong, Markeev, Andrey M
Published in ACS applied materials & interfaces (24.01.2018)

Get full text

Journal Article

Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material

Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material

by Schroeder, Uwe, Richter, Claudia, Park, Min Hyuk, Schenk, Tony, Pešić, Milan, Hoffmann, Michael, Fengler, Franz P. G, Pohl, Darius, Rellinghaus, Bernd, Zhou, Chuanzhen, Chung, Ching-Chang, Jones, Jacob L, Mikolajick, Thomas
Published in Inorganic chemistry (05.03.2018)

Get full text

Journal Article

Reversible transition between the polar and antipolar phases and its implications for wake-up and fatigue in HfO2-based ferroelectric thin film

Reversible transition between the polar and antipolar phases and its implications for wake-up and fatigue in HfO2-based ferroelectric thin film

by Cheng, Yan, Gao, Zhaomeng, Ye, Kun Hee, Park, Hyeon Woo, Zheng, Yonghui, Zheng, Yunzhe, Gao, Jianfeng, Park, Min Hyuk, Choi, Jung-Hae, Xue, Kan-Hao, Hwang, Cheol Seong, Lyu, Hangbing
Published in Nature communications (03.02.2022)

Get full text

Journal Article

Understanding the formation of the metastable ferroelectric phase in hafnia-zirconia solid solution thin films

Understanding the formation of the metastable ferroelectric phase in hafnia-zirconia solid solution thin films

by Park, Min Hyuk, Lee, Young Hwan, Kim, Han Joon, Kim, Yu Jin, Moon, Taehwan, Kim, Keum Do, Hyun, Seung Dam, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong
Published in Nanoscale (01.01.2018)

Get full text

Journal Article

Thermodynamic and Kinetic Origins of Ferroelectricity in Fluorite Structure Oxides

Thermodynamic and Kinetic Origins of Ferroelectricity in Fluorite Structure Oxides

by Park, Min Hyuk, Lee, Young Hwan, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong
Published in Advanced electronic materials (01.03.2019)

Get full text

Journal Article

Effect of Zr Content on the Wake-Up Effect in Hf1-xZrxO2 Films

Effect of Zr Content on the Wake-Up Effect in Hf1-xZrxO2 Films

by Park, Min Hyuk, Kim, Han Joon, Kim, Yu Jin, Lee, Young Hwan, Moon, Taehwan, Kim, Keum Do, Hyun, Seung Dam, Fengler, Franz, Schroeder, Uwe, Hwang, Cheol Seong
Published in ACS applied materials & interfaces (22.06.2016)

Get full text

Journal Article

Giant Negative Electrocaloric Effects of Hf0.5Zr0.5O2 Thin Films

Giant Negative Electrocaloric Effects of Hf0.5Zr0.5O2 Thin Films

by Park, Min Hyuk, Kim, Han Joon, Kim, Yu Jin, Moon, Taehwan, Kim, Keum Do, Lee, Young Hwan, Hyun, Seung Dam, Hwang, Cheol Seong
Published in Advanced materials (Weinheim) (28.09.2016)

Get full text

Journal Article

Interplay between oxygen defects and dopants: effect on structure and performance of HfO2-based ferroelectrics

Interplay between oxygen defects and dopants: effect on structure and performance of HfO2-based ferroelectrics

by Materano, Monica, Lomenzo, Patrick D, Kersch, Alfred, Park, Min Hyuk, Mikolajick, Thomas, Schroeder, Uwe
Published in Inorganic chemistry frontiers (01.01.2021)

Get full text

Journal Article

Origin of Ferroelectric Phase in Undoped HfO2 Films Deposited by Sputtering

Origin of Ferroelectric Phase in Undoped HfO2 Films Deposited by Sputtering

by Mittmann, Terence, Materano, Monica, Lomenzo, Patrick D., Park, Min Hyuk, Stolichnov, Igor, Cavalieri, Matteo, Zhou, Chuanzhen, Chung, Ching‐Chang, Jones, Jacob L., Szyjka, Thomas, Müller, Martina, Kersch, Alfred, Mikolajick, Thomas, Schroeder, Uwe
Published in Advanced materials interfaces (07.06.2019)

Get full text

Journal Article

Voltage Drop in a Ferroelectric Single Layer Capacitor by Retarded Domain Nucleation

Voltage Drop in a Ferroelectric Single Layer Capacitor by Retarded Domain Nucleation

by Kim, Yu Jin, Park, Hyeon Woo, Hyun, Seung Dam, Kim, Han Joon, Kim, Keum Do, Lee, Young Hwan, Moon, Taehwan, Lee, Yong Bin, Park, Min Hyuk, Hwang, Cheol Seong
Published in Nano letters (13.12.2017)

Get full text

Journal Article

Dispersion in Ferroelectric Switching Performance of Polycrystalline Hf0.5Zr0.5O2 Thin Films

Dispersion in Ferroelectric Switching Performance of Polycrystalline Hf0.5Zr0.5O2 Thin Films

by Hyun, Seung Dam, Park, Hyeon Woo, Kim, Yu Jin, Park, Min Hyuk, Lee, Young Hwan, Kim, Han Joon, Kwon, Young Jae, Moon, Taehwan, Kim, Keum Do, Lee, Yong Bin, Kim, Baek Su, Hwang, Cheol Seong
Published in ACS applied materials & interfaces (17.10.2018)

Get full text

Journal Article

Effect of acceptor doping on phase transitions of HfO2 thin films for energy-related applications

Effect of acceptor doping on phase transitions of HfO2 thin films for energy-related applications

by Park, Min Hyuk, Schenk, Tony, Hoffmann, Michael, Knebel, Steve, Gärtner, Jan, Mikolajick, Thomas, Schroeder, Uwe
Published in Nano energy (01.06.2017)

Get full text

Journal Article

On the Origin of the Large Remanent Polarization in La:HfO2

On the Origin of the Large Remanent Polarization in La:HfO2

by Schenk, Tony, Fancher, Chris M., Park, Min Hyuk, Richter, Claudia, Künneth, Christopher, Kersch, Alfred, Jones, Jacob L., Mikolajick, Thomas, Schroeder, Uwe
Published in Advanced electronic materials (01.12.2019)

Get full text

Journal Article

1
2
3
4
5
6
7
8
9
10
11
Next
[16]