CMOS device on ultrathin SOI with a deposited raised source/drain, and a method of manufacture
Lee, Byoung, Park, Heemyong, Agnello, Paul, Schepis, Dominic, Shahidi, Ghavam
Year of Publication 08.07.2004
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Year of Publication 08.07.2004
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CMOS structure with non-epitaxial raised source/drain and self-aligned gate and method of manufacture
SHAHIDI, GHAVAM G, ASSADERAGHI, FARIBORZ, AJMERA, ATUL C, PARK, HEEMYONG
Year of Publication 11.11.2003
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Year of Publication 11.11.2003
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CMOS structure with non-epitaxial raised source/drain and self-aligned gate and method of manufacture
Park, Heemyong, Assaderaghi, Fariborz, Ajmera, Atul C, Shahidi, Ghavam G
Year of Publication 20.05.2003
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Year of Publication 20.05.2003
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