Real-Time End-Point Detection Using Modified Principal Component Analysis for Small Open Area SiO2 Plasma Etching
Han, Kyounghoon, Yoon, En Sup, Lee, Jaewon, Chae, Heeyeop, Han, Kwang Hoon, Park, Kun Joo
Published in Industrial & engineering chemistry research (04.06.2008)
Published in Industrial & engineering chemistry research (04.06.2008)
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Journal Article
Analysis of Novel Helmholtz-inductively Coupled Plasma Source and Its Application for Nano-Scale MOSFETs
Park, Kun-Joo, Kim, Kee-Hyun, Lee, Weon-Mook, Chae, Hee-Yeop, Han, In-Shik, Lee, Hi-Deok
Published in Transactions on electrical and electronic materials (25.04.2009)
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Published in Transactions on electrical and electronic materials (25.04.2009)
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