A New Monocyclic Fluoropolymer for 157-nm Photoresists
Sasaki, Takashi, Takebe, Yoko, eda, Masataka, Yokokoji, Osamu, Irie, Shigeo, Otoguro, Akihito, Fujii, Kiyoshi, Itani, Toshio
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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