Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma
Kamataki, Kunihiro, Nagamatsu, Daiki, Yang, Tao, Abe, Kohei, Yamamoto, Akihiro, Nagao, Iori, Arima, Toshiaki, Otaka, Michihiro, Yamamoto, Yuma, Yamashita, Daisuke, Okumura, Takamasa, Yamashita, Naoto, Itagaki, Naho, Koga, Kazunori, Shiratani, Masaharu
Published in AIP advances (01.08.2022)
Published in AIP advances (01.08.2022)
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Journal Article
Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes: particle-in-cell/Monte Carlo collision model simulation
Abe, Kohei, Kamataki, Kunihiro, Yamamoto, Akihiro, Nagao, Iori, Otaka, Michihiro, Yamashita, Daisuke, Okumura, Takamasa, Yamashita, Naoto, Itagaki, Naho, Koga, Kazunori, Shiratani, Masaharu
Published in Japanese Journal of Applied Physics (01.10.2022)
Published in Japanese Journal of Applied Physics (01.10.2022)
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Journal Article
Spatio-temporal measurements Ar 2p1 excitation rates and optical emission spectroscopy by capacitively coupled Ar and Ne mixed gas plasma
Otaka, Michihiro, Arima, Toshiaki, Lai, Jiansyun, Ikeda, Kizuki, Kamataki, Kunihiro, Yamashita, Naoto, Okumura, Takamasa, Itagaki, Naho, Koga, Kazunori, Shiratani, Masaharu
Published in MRS advances (11.07.2022)
Published in MRS advances (11.07.2022)
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Journal Article
One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges
Nagao, Iori, Kamataki, Kunihiro, Yamamoto, Akihiro, Otaka, Michihiro, Yamamoto, Yuma, Yamashita, Daisuke, Yamashita, Naoto, Okumura, Takamasa, Itagaki, Naho, Koga, Kazunori, Shiratani, Masaharu
Published in MRS advances (05.12.2022)
Published in MRS advances (05.12.2022)
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Journal Article
Deposition of hydrogenated amorphous carbon films by CH 4 /Ar capacitively coupled plasma using tailored voltage waveform discharges
Otaka, Michihiro, Otomo, Hiroshi, Ikeda, Kizuku, Lai, Jian-Syun, Wakita, Daichi, Kamataki, Kunihiro, Koga, Kazunori, Shiratani, Masaharu, Nagamatsu, Daiki, Shindo, Takahiro, Matsudo, Tatsuo
Published in Japanese Journal of Applied Physics (01.07.2024)
Published in Japanese Journal of Applied Physics (01.07.2024)
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Journal Article
Deposition of hydrogenated amorphous carbon films by CH4/Ar capacitively coupled plasma using tailored voltage waveform discharges
Otaka, Michihiro, Otomo, Hiroshi, Ikeda, Kizuku, Lai, Jian-Syun, Wakita, Daichi, Kamataki, Kunihiro, Koga, Kazunori, Shiratani, Masaharu, Nagamatsu, Daiki, Shindo, Takahiro, Matsudo, Tatsuo
Published in Japanese Journal of Applied Physics (01.07.2024)
Published in Japanese Journal of Applied Physics (01.07.2024)
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Journal Article