Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
Ehm, Dirk Heinrich, Van De Runstraat, Annemieke, Wolschrijn, Bastiaan Theodoor, Storm, Arnoldus Jan, Stein, Thomas, Meijerink, Marco G. H, Bastein, A. G. Ton M, Van Soest-Vercammen, Esther L. J, Koster, Norbertus Benedictus, Gubbels, Frits G. H. M, Oprel, Peter J, Nienoord, Michiel, Riepen, Michel, Moors, Johannes Hubertus Josephina
Year of Publication 14.06.2011
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Year of Publication 14.06.2011
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Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MEIJERINK MARCO G. H, STORM ARNOLDUS JAN, NIENOORD MICHIEL, MOORS JOHANNES HUBERTUS JOSEPHINA, VAN SOEST-VERCAMMEN ESTHER L. J, OPREL PETER J, GUBBELS FRITS G. H. M, VAN DE RUNSTRAAT ANNEMIEKE, RIEPEN MICHEL, STEIN THOMAS, KOSTER NORBERTUS BENEDICTUS, BASTEIN A. G. TON M
Year of Publication 14.06.2011
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Year of Publication 14.06.2011
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OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HEATED OPTICAL ELEMENT, OPERATING METHODS, AND METHODS FOR CLEANING AS WELL AS FOR PROVIDING AN OPTICAL ELEMENT
WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MEIJERINK MARCO G. H, STORM ARNOLDUS JAN, NIENOORD MICHIEL, MOORS JOHANNES HUBERTUS JOSEPHINA, VAN SOEST-VERCAMMEN ESTHER L. J, OPREL PETER J, GUBBELS FRITS G. H. M, VAN DE RUNSTRAAT ANNEMIEKE, RIEPEN MICHEL, STEIN THOMAS, KOSTER NORBERTUS BENEDICTUS, BASTEIN A. G. TON M
Year of Publication 19.06.2008
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Year of Publication 19.06.2008
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Cleaning method for reflective optical element, particularly for soft X-ray and extreme ultraviolet wavelength range, and for operation of extreme ultraviolet lithography device, involves heating reflective optical element
RIEPEN, MICHEL, STORM, ARNOLD, RUNSTRAAT, ANNEMIEKE VAN DE, OPREL, PETER J, EHM, DIRK HEINRICH, KOSTER, NORBERTUS BENEDICTUS, NIENOORD, MICHIEL, WOLSCHRIJN, BASTIAAN THEODOOR, STEIN, THOMAS, GUBBELS, FRITS G.H.M, MOORS, ROEL JOHANNES HUBERTUS JOSEPHINA, BASTEIN, TON, SOEST-VERCAMMEN, ESTHER L.J, MEIJERINK, MARCO G. H
Year of Publication 03.04.2008
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Year of Publication 03.04.2008
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Verfahren zum Betrieb einer EUV-Lithographievorrichtung, reflektives optisches Element für EUV-Lithographievorrichtung und Verfahren zu dessen Reinigung
RIEPEN, MICHEL, STORM, ARNOLD, RUNSTRAAT, ANNEMIEKE VAN DE, OPREL, PETER J, EHM, DIRK HEINRICH, KOSTER, NORBERTUS BENEDICTUS, NIENOORD, MICHIEL, WOLSCHRIJN, BASTIAAN THEODOOR, STEIN, THOMAS, GUBBELS, FRITS G.H.M, MOORS., ROEL JOHANNES HUBERTUS JOSEPHINA, BASTEIN, TON, SOEST-VERCAMMEN, ESTHER L.J., VAN, MEIJERINK, MARCO G. H
Year of Publication 19.01.2012
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Year of Publication 19.01.2012
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