Rapid heat treatment for spin coated ITO films by electron plasma annealing method
Wakagi, Masatoshi, Chahara, Ken-ichi, Onisawa, Ken-ichi, Kawakubo, Yukio, Kichikawa, Toshimichi, Satoh, Tadashi, Minemura, Tetsuroh
Published in Thin solid films (22.05.2002)
Published in Thin solid films (22.05.2002)
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Conference Proceeding
TiO2 / SiO2 Multilayer Insulating Films for ELDs
Nakayama, T., Onisawa, K., Fuyama, M., Hanazono, M.
Published in Journal of the Electrochemical Society (01.04.1992)
Published in Journal of the Electrochemical Society (01.04.1992)
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Journal Article
Oxygen in SrS phosphor powder and its effects on performance of thin film electroluminescent devices
ONISAWA, K.-I, ABE, Y, TAMURA, K, NAKAYAMA, T, HANAZONO, M, ONO, Y. A
Published in Journal of the Electrochemical Society (01.02.1991)
Published in Journal of the Electrochemical Society (01.02.1991)
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Temperature dependence in emission characteristics of an organic EL cell with 8-hydroxyquinoline aluminum emitting layer
ABE, Y, ONISAWA, K.-I, ARATANI, S, HANAZONO, M
Published in Journal of the Electrochemical Society (01.03.1992)
Published in Journal of the Electrochemical Society (01.03.1992)
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Effects of oxygen in CaS : Eu active layers on emission properties of thin film electroluminescent cells
ABE, Y, ONISAWA, K.-I, ONO, Y. A, HANAZONO, M
Published in Japanese Journal of Applied Physics (01.08.1990)
Published in Japanese Journal of Applied Physics (01.08.1990)
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Electroluminescence in CaO : Eu thin film
ABE, Y, ONISAWA, K.-I, ONO, Y. A, HANAZONO, M
Published in Japanese Journal of Applied Physics (01.02.1990)
Published in Japanese Journal of Applied Physics (01.02.1990)
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Journal Article
Ultra Thin TiN Films Prepared by an Advanced Ion-Plating Method
Uetani, Kazuo, Kajiyama, Hiroshi, Yamaguchi, Tomoko, Nose, Koichi, Onisawa, Ken-ichi, Minemura, Tetsuroh
Published in Materials Transactions, JIM (2000)
Published in Materials Transactions, JIM (2000)
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Conference Proceeding
Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550 x 650 mm) substrates: Selected papers revised from the proceedings of the fourth international symposium on sputtering and plasma processes (ISSP'97)
NAKAJIMA, K, ONISAWA, K.-I, CHAHARA, K.-I, MINEMURA, T, KAMEI, M, SETOYAMA, E
Published in Vacuum (1998)
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Published in Vacuum (1998)
Journal Article
TiO2/SiO2 multilayer insulating films for ELDs
NAKAYAMA, T, ONISAWA, K, FUYAMA, M, HANAZONO, M
Published in Journal of the Electrochemical Society (1992)
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Published in Journal of the Electrochemical Society (1992)
Journal Article
Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550×650 mm) substrates
Nakajima, Katsunori, Onisawa, Ken-ichi, Chahara, Ken-ichi, Minemura, Tetsuroh, Kamei, Mitsuhiro, Setoyama, Eiji
Published in Vacuum (01.12.1998)
Published in Vacuum (01.12.1998)
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Flat and Large Poly-Si Grains by a Continuous Process of Plasma-Enhanced Chemical Vapor Deposition of a-Si and Its Direct Laser Crystallization
Mimura, Akio, Shinagawa, Youmei, Kawachi, Genshirou, Onisawa, Kenichi, Minemura, Tetsurou, Hara, Masayuki, Ishida, Takeshige, Takeda, Tomohiko
Published in Japanese Journal of Applied Physics (01.08.2000)
Published in Japanese Journal of Applied Physics (01.08.2000)
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Journal Article
Transferred charge in the active layer and EL device characteristics of TFEL cells
ONO, Y. A, KAWAKAMI, H, FUYAMA, M, ONISAWA, K
Published in Japanese Journal of Applied Physics (01.09.1987)
Published in Japanese Journal of Applied Physics (01.09.1987)
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Luminance improvement of blue-green emitting SrS:Ce EL cell by controlling vacuum conditions with sulfur addition
ONISAWA, K, FUYAMA, M, TAGUCHI, K, TAMURA, K, ONO, Y. A
Published in Journal of the Electrochemical Society (01.10.1988)
Published in Journal of the Electrochemical Society (01.10.1988)
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