Investigation of phonon coherence and backscattering using silicon nanomeshes
Lee, Jaeho, Lee, Woochul, Wehmeyer, Geoff, Dhuey, Scott, Olynick, Deirdre L., Cabrini, Stefano, Dames, Chris, Urban, Jeffrey J., Yang, Peidong
Published in Nature communications (04.01.2017)
Published in Nature communications (04.01.2017)
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Journal Article
Sub-10 nm Nanofabrication via Nanoimprint Directed Self-Assembly of Block Copolymers
Park, Sang-Min, Liang, Xiaogan, Harteneck, Bruce D, Pick, Teresa E, Hiroshiba, Nobuya, Wu, Ying, Helms, Brett A, Olynick, Deirdre L
Published in ACS nano (22.11.2011)
Published in ACS nano (22.11.2011)
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Journal Article
High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates
Gu, Xiaodan, Liu, Zuwei, Gunkel, Ilja, Chourou, S. T., Hong, Sung Woo, Olynick, Deirdre L., Russell, Thomas P.
Published in Advanced materials (Weinheim) (08.11.2012)
Published in Advanced materials (Weinheim) (08.11.2012)
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Journal Article
Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
Dallorto, Stefano, Staaks, Daniel, Schwartzberg, Adam, Yang, XiaoMin, Lee, Kim Y, Rangelow, Ivo W, Cabrini, Stefano, Olynick, Deirdre L
Published in Nanotechnology (05.10.2018)
Published in Nanotechnology (05.10.2018)
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Journal Article
Fundamental understanding of chemical processes in extreme ultraviolet resist materials
Kostko, Oleg, Xu, Bo, Ahmed, Musahid, Slaughter, Daniel S, Ogletree, D Frank, Closser, Kristina D, Prendergast, David G, Naulleau, Patrick, Olynick, Deirdre L, Ashby, Paul D, Liu, Yi, Hinsberg, William D, Wallraff, Gregory M
Published in The Journal of chemical physics (21.10.2018)
Published in The Journal of chemical physics (21.10.2018)
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Journal Article
Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography
Voet, Vincent S. D, Pick, Teresa E, Park, Sang-Min, Moritz, Manuel, Hammack, Aaron T, Urban, Jeffrey J, Ogletree, D. Frank, Olynick, Deirdre L, Helms, Brett A
Published in Journal of the American Chemical Society (09.03.2011)
Published in Journal of the American Chemical Society (09.03.2011)
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Journal Article
Formation of Bandgap and Subbands in Graphene Nanomeshes with Sub-10 nm Ribbon Width Fabricated via Nanoimprint Lithography
Liang, Xiaogan, Jung, Yeon-Sik, Wu, Shiwei, Ismach, Ariel, Olynick, Deirdre L, Cabrini, Stefano, Bokor, Jeffrey
Published in Nano letters (14.07.2010)
Published in Nano letters (14.07.2010)
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Journal Article
Selective Laser Ablation in Resists and Block Copolymers for High Resolution Lithographic Patterning
Olynick, Deirdre L., Perera, Pradeep, Schwartzberg, Adam, Kulshreshta, Prashant, Oteyza, Dimas G. De, Jarnagin, Nathan, Henderson, Cliff, Sun, Zhiwei, Gunkel, Ilja, Russell, Thomas, Budden, Matthias, Rangelow, Ivo W.
Published in Journal of Photopolymer Science and Technology (01.01.2015)
Published in Journal of Photopolymer Science and Technology (01.01.2015)
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Journal Article
Improved Pattern Transfer in Nanoimprint Lithography at 30 nm Half-Pitch by Substrate−Surface Functionalization
Jung, Gun-Young, Li, Zhiyong, Wu, Wei, Ganapathiappan, S, Li, Xuema, Olynick, Deirdre L, Wang, S. Y, Tong, William M, Williams, R. Stanley
Published in Langmuir (05.07.2005)
Published in Langmuir (05.07.2005)
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Journal Article
Polymer-metal coating for high contrast SEM cross sections at the deep nanoscale
Staaks, Daniel, Olynick, Deirdre L, Rangelow, Ivo W, Altoe, M Virginia P
Published in Nanoscale (13.12.2018)
Published in Nanoscale (13.12.2018)
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Journal Article
Selectively accessing the hotspots of optical nanoantennas by self-aligned dry laser ablation
Schäfer, Christian, Perera, Pradeep N, Laible, Florian, Olynick, Deirdre L, Schwartzberg, Adam M, Weber-Bargioni, Alexander, Cabrini, Stefano, Schuck, P. James, Kern, Dieter P, Fleischer, Monika
Published in Nanoscale (01.10.2020)
Published in Nanoscale (01.10.2020)
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Journal Article
Vapor-Phase Self-Assembled Monolayer for Improved Mold Release in Nanoimprint Lithography
Jung, Gun-Young, Li, Zhiyong, Wu, Wei, Chen, Yong, Olynick, Deirdre L, Wang, Shih-Yuan, Tong, William M, Williams, R. Stanley
Published in Langmuir (15.02.2005)
Published in Langmuir (15.02.2005)
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Journal Article
Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography
Kulshreshtha, Prashant K, Maruyama, Ken, Kiani, Sara, Blackwell, James, Olynick, Deirdre L, Ashby, Paul D
Published in Nanotechnology (08.08.2014)
Published in Nanotechnology (08.08.2014)
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Journal Article
Low temperature dry etching of chromium towards control at sub-5 nm dimensions
Staaks, Daniel, Yang, XiaoMin, Lee, Kim Y, Dhuey, Scott D, Sassolini, Simone, Rangelow, Ivo W, Olynick, Deirdre L
Published in Nanotechnology (14.10.2016)
Published in Nanotechnology (14.10.2016)
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Journal Article
Nanoimprint-Induced Molecular Stacking and Pattern Stabilization in a Solution-Processed Subphthalocyanine Film
Liang, Xiaogan, Chen, Teresa, Jung, Yeon-Sik, Miyamoto, Yoshikazu, Han, Gang, Cabrini, Stefano, Ma, Biwu, Olynick, Deirdre L
Published in ACS nano (25.05.2010)
Published in ACS nano (25.05.2010)
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Journal Article
link between nanoscale feature development in a negative resist and the Hansen solubility sphere
Olynick, Deirdre L, Ashby, Paul D, Lewis, Mark D, Jen, Timothy, Lu, Haoren, Liddle, J. Alexander, Chao, Weilun
Published in Journal of polymer science. Part B, Polymer physics (01.11.2009)
Published in Journal of polymer science. Part B, Polymer physics (01.11.2009)
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