Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
Triyoso, Dina H., Hempel, K., Ohsiek, S., Jaschke, V., Shu, J., Mutas, S., Dittmar, K., Schaeffer, J., Utess, D., Lenski, M.
Published in ECS journal of solid state science and technology (01.01.2013)
Published in ECS journal of solid state science and technology (01.01.2013)
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Journal Article
Interface engineering for the TaN/Ta barrier film deposition process to control Ta-crystal growth
Gerlich, Lukas, Ohsiek, Susanne, Klein, Christoph, Geiß, Mario, Friedemann, Michael, Kücher, Peter, Schmeißer, Dieter
Published in Microelectronic engineering (01.06.2013)
Published in Microelectronic engineering (01.06.2013)
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Conference Proceeding
Impact of precursors choice on characteristics of PEALD SiN for spacer applications
Triyoso, D. H., Hempel, K., Ohsiek, S., Shu, J., Schaeffer, J. K., Lenski, M.
Published in Proceedings of 2013 International Conference on IC Design & Technology (ICICDT) (01.05.2013)
Published in Proceedings of 2013 International Conference on IC Design & Technology (ICICDT) (01.05.2013)
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Conference Proceeding
ALD Ta2O5 and Hf-doped Ta2O5 for BEOL compatible MIM
Triyoso, D. H., Weinreich, W., Seidell, K., Nolan, M. G., Polakowski, P., Utess, D., Ohsiek, S., Dittmar, K., Weisheit, M., Licbau, M., Fox, R.
Published in 2014 IEEE International Conference on IC Design & Technology (01.05.2014)
Published in 2014 IEEE International Conference on IC Design & Technology (01.05.2014)
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Conference Proceeding
Physical and Electrical Properties of MOCVD and ALD Deposited HfZrO 4 Gate Dielectrics for 32nm CMOS High Performance Logic SOI Technologies
Kelwing, Torben, Mutas, Sergej, Trentzsch, Martin, Naumann, Andreas, Trui, Bernhard, Herrmann, Lutz, Graetsch, Falk, Klein, Christoph, Wilde, Lutz, Ohsiek, Susanne, Weisheit, Martin, Peeva, Anita, Richter, Inka, Prinz, Hartmut, Wuerfel, Alexander, Carter, Rick, Stephan, Rolf, Kücher, Peter, Hansch, Walter
Published in ECS transactions (01.10.2010)
Published in ECS transactions (01.10.2010)
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Journal Article
Ultrathin TaN/Ta barrier modifications to fullfill next technology node requirements
Gerlich, L., Ohsiek, S., Klein, C., Geiss, M., Friedemann, M., Kucher, P., Schmeisser, D.
Published in 2011 IEEE International Interconnect Technology Conference (01.05.2011)
Published in 2011 IEEE International Interconnect Technology Conference (01.05.2011)
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Conference Proceeding
A comparative study of thermal and plasma enhanced ALD Ta-N-C films on SiO2, SiCOH and Cu substrates
Wojcik, H., Friedemann, M., Feustel, F., Albert, M., Ohsiek, S., Metzger, J., Voss, J., Bartha, J.W., Wenzel, C.
Published in 2007 IEEE International Interconnect Technology Conferencee (01.06.2007)
Published in 2007 IEEE International Interconnect Technology Conferencee (01.06.2007)
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Conference Proceeding
SHIFT COLLAR ASSEMBLY FOR A POWER TRANSFER UNIT
GERDING AUSTIN R, ORAM SAMUEL J, OHSIEK RICK, PALAZZOLO JOSEPH, ARDEN TONY, ENGERER DANIEL
Year of Publication 23.12.2015
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Year of Publication 23.12.2015
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