Fabrication of FinFETs by Damage-Free Neutral-Beam Etching Technology
Endo, K., Shuichi Noda, Masahara, M., Kubota, T., Ozaki, T., Samukawa, S., Yongxun Liu, Ishii, K., Ishikawa, Y., Sugimata, E., Matsukawa, T., Takashima, H., Yamauchi, H., Suzuki, E.
Published in IEEE transactions on electron devices (01.08.2006)
Published in IEEE transactions on electron devices (01.08.2006)
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