Effect of Boron and Fluorine Incorporation in SiON Gate Insulator with Optimized Nitrogen Profile
Sasaki, Takaoki, Ootsuka, Fumio, Ozaki, Hiroji, Hoshi, Takeshi, Tomikawa, Mitsuhiro, Yasuhira, Mitsuo, Arikado, Tsunetoshi
Published in Japanese Journal of Applied Physics (01.04.2004)
Published in Japanese Journal of Applied Physics (01.04.2004)
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Evaluation of transistor property variations within chips on 300-mm wafers using a new MOSFET array test structure
Izumi, N., Ozaki, H., Nakagawa, Y., Kasai, N., Arikado, T.
Published in IEEE transactions on semiconductor manufacturing (01.08.2004)
Published in IEEE transactions on semiconductor manufacturing (01.08.2004)
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Conference Proceeding
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
OZAKI, HIROJI, EIMORI, TAKAHISA, TANAKA, YOSHINORI, SATOU, SHINICHI, WAGAMIYA, WADARU
Year of Publication 17.12.1992
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Year of Publication 17.12.1992
Patent
RU 28965, A NEW MACROLIDE, IN ORAL AND MAXILLARY INFECTIONS
TAKAI, HIROSHI, IKESHIMA, KATSUYOSHI, OZAKI, HIROJI, OKADA, YASUYUKI, ASAKURA, TSUTOMU, YOSHIDA, HIROSHI, NAGASAKI, AKIO
Published in CHEMOTHERAPY (1988)
Published in CHEMOTHERAPY (1988)
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CLINICAL EVALUATION ON NEW QUINOLONE T-3262 IN ACUTE ORAL AND MAXILLARY INFECTIONS
TAKAI, HIROSHI, OZAKI, HIROJI, MORI, SHINSUKE, TAKEMOTO, YASUSHI, OKADA, YASUYUKI, SHIGA, KEIKO, IKESHIMA, KATSUYOSHI, ADACHI, FUKASHI
Published in CHEMOTHERAPY (20.12.1988)
Published in CHEMOTHERAPY (20.12.1988)
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