Modification of Porous Alumina Membranes Using Al2O3 Atomic Layer Controlled Deposition
Ott, A. W, Klaus, J. W, Johnson, J. M, George, S. M, McCarley, K. C, Way, J. D
Published in Chemistry of materials (18.03.1997)
Published in Chemistry of materials (18.03.1997)
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Atomic layer controlled deposition of SiO2 and Al2O3 using ABAB... binary reaction sequence chemistry
GEORGE, S. M, SNEH, O, DILLON, A. C, WISE, M. L, OTT, A. W, OKADA, L. A, WAY, J. D
Published in Applied surface science (01.12.1994)
Published in Applied surface science (01.12.1994)
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Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry
OTT, A. W, MCCARLEY, K. C, KLAUS, J. W, WAY, J. D, GEORGE, S. M
Published in Applied surface science (01.11.1996)
Published in Applied surface science (01.11.1996)
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Plasma-Assisted MOCVD Growth of Superconducting NbN Thin Films Using Nb Dialkylamide and Nb Alkylimide Precursors
Liu, X., Babcock, J. R., Lane, M. A., Belot, J. A., Ott, A. W., Metz, M. V., Kannewurf, C. R., Chang, R. P. H., Marks, T. J.
Published in Chemical vapor deposition (01.01.2001)
Published in Chemical vapor deposition (01.01.2001)
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Modification of Porous Alumina Membranes Using Al 2 O 3 Atomic Layer Controlled Deposition
Ott, A. W., Klaus, J. W., Johnson, J. M., George, S. M., McCarley, K. C., Way, J. D.
Published in Chemistry of materials (01.03.1997)
Published in Chemistry of materials (01.03.1997)
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Surface chemistry of In2O3 deposition using In(CH3)3 and H2O in a binary reaction sequence
OTT, A. W, JOHNSON, J. M, KLAUS, J. W, GEORGE, S. M
Published in Applied surface science (01.03.1997)
Published in Applied surface science (01.03.1997)
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