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Method and device for permanently repairing defects of absent material of a photolithographic mask
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APPARATUS AND METHOD FOR REMOVING A SINGLE PARTICULATE FROM A SUBSTRATE
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Year of Publication 13.01.2022
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METHOD AND DEVICE FOR PERMANENTLY REPAIRING DEFECTS OF ABSENT MATERIAL OF A PHOTOLITHOGRAPHIC MASK
Bret, Tristan, Hofmann, Thorsten, Oster, Jens, Kornilov, Kinga, Schneider, Horst
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Year of Publication 17.10.2019
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Method and device for permanently repairing defects of absent material of a photolithographic mask
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Guided vortex motion in Nb films on facetted substrate surfaces
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Published in Physica. C, Superconductivity (01.05.2003)
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Apparatus and method for removing a single particulate from a substrate
OSTER, JENS, SIELAFF, TILO, EDINGER, KLAUS, HERMANNS, CHRISTIAN FELIX, BAUR, CHRISTOF, KOMPANIIETS, MAKSYM
Year of Publication 16.07.2024
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Year of Publication 16.07.2024
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