Improvement of Flare Modeling and Derivation for Extreme Ultraviolet Optics
Shiraishi, Masayuki, Oshino, Tetsuya, Murakami, Katsuhiko, Chiba, Hiroshi
Published in Japanese Journal of Applied Physics (01.06.2011)
Published in Japanese Journal of Applied Physics (01.06.2011)
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Journal Article
Improvement of Flare Modeling and Derivation for Extreme Ultraviolet Optics
Shiraishi, Masayuki, Oshino, Tetsuya, Murakami, Katsuhiko, Chiba, Hiroshi
Published in Japanese Journal of Applied Physics (01.06.2011)
Published in Japanese Journal of Applied Physics (01.06.2011)
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Journal Article
Shearing Interferometry for at Wavelength Wavefront Measurement of Extreme-Ultraviolet Lithography Projection Optics
Zhu, Yucong, Sugisaki, Katsumi, Murakami, Katsuhiko, Ota, Kazuya, Kondo, Hiroyuki, Ishii, Mikihiko, Kawakami, Jun, Oshino, Tetsuya, Saito, Jun, Suzuki, Akiyoshi, Hasegawa, Masanobu, Sekine, Yoshiyuki, Takeuchi, Seiji, Ouchi, Chidane, Kakuchi, Osamu, Watanabe, Yutaka, Hasegawa, Takayuki, Hara, Shinichi
Published in Japanese Journal of Applied Physics (2003)
Published in Japanese Journal of Applied Physics (2003)
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Narrow-bandpass multilayer mirrors for an extreme-ultraviolet Doppler telescope
Hara, H, Nagata, S, Kano, R, Kumagai, K, Sakao, T, Shimizu, T, Tsuneta, S, Yoshida, T, Ishiyama, W, Oshino, T, Murakami, K
Published in Applied optics (2004) (01.11.1999)
Published in Applied optics (2004) (01.11.1999)
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Fabrication of 0.1 µm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
Nagata, Hiroshi, Ohtani, Masayuki, Murakami, Katsuhiko, Oshino, Tetsuya, Oizumi, Hiroaki, Maejima, Yukihiko, Watanabe, Takeo, Taguchi, Takao, Yamashita, Yoshio, Atoda, Nobufumi
Published in Japanese Journal of Applied Physics (01.01.1994)
Published in Japanese Journal of Applied Physics (01.01.1994)
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Improvement of the uniformity of tungsten/carbon multilayers by thermal processing
OSHINO, T, MURAKAMI, K, NAKAMURA, H, OHTANI, M, NAGATA, H
Published in Japanese Journal of Applied Physics (1994)
Published in Japanese Journal of Applied Physics (1994)
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LIGHT-EXPOSURE METHOD AND DEVICE, AND DEVICE PRODUCTION METHOD
OSHINO TETSUYA, UMEMOTO TAKAAKI, INOUE JIRO, OTA KAZUYA, MURAKAMI KATSUHIKO, KONDO HIROYUKI
Year of Publication 03.04.2014
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Year of Publication 03.04.2014
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