Search Results - "ORIHARA TOSHIHIKO" :: K.UTB vyhledávací portál

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METHOD FOR MANUFACTURING SUBSTRATE, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD FOR MANUFACTURING MASK BLANK, AND METHOD FOR MANUFACTURING TRANSFER MASK

by ORIHARA TOSHIHIKO
Year of Publication 05.10.2017

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METHOD FOR MANUFACTURING MASK BLANK SUBSTRATE, METHOD FOR MANUFACTURING SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR MANUFACTURING MASK BLANK, AND METHOD FOR MANUFACTURING TRANSFER MASK

by ORIHARA TOSHIHIKO
Year of Publication 12.08.2016

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SUBSTRATE FOR MASK BLANK, SUBSTRATE WITH MULTILAYERED REFLECTION FILM, REFLECTION TYPE MASK BLANK, REFLECTION TYPE MASK AND MANUFACTURING METHOD OF SEMICONDUCTOR

by ORIHARA TOSHIHIKO, HAMAMOTO KAZUHIRO
Year of Publication 01.11.2018

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PRODUCTION METHOD OF SUBSTRATE, PRODUCTION METHOD OF SUBSTRATE FOR MASK BLANK, PRODUCTION METHOD OF MASK BLANK, PRODUCTION METHOD OF MASKS FOR TRANSFER, AND SUBSTRATE PRODUCTION APPARATUS

by SHOKI TSUTOMU, ORIHARA TOSHIHIKO
Year of Publication 17.05.2018

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MANUFACTURING METHOD OF MASK BLANK SUBSTRATE, MANUFACTURING METHOD OF SUBSTRATE WITH MULTILAYER FILM, MANUFACTURING METHOD OF MASK BLANK, MANUFACTURING METHOD OF TRANSFER MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

by ORIHARA TOSHIHIKO, IKEBE YOHEI
Year of Publication 05.10.2017

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SUBSTRATE PROVIDED WITH MULTILAYER REFLECTIVE FILM, MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD

by ORIHARA TOSHIHIKO, HAMAMOTO KAZUHIRO
Year of Publication 01.06.2016

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METHOD OF MANUFACTURING SUBSTRATE, METHOD OF MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD OF MANUFACTURING MASK BLANK, AND METHOD OF MANUFACTURING TRANSFER MASK

by SHOKI TSUTOMU, ORIHARA TOSHIHIKO
Year of Publication 09.05.2016

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GLASS SUBSTRATE FOR MASK BLANK SUBSTRATE WITH MULTILAYER REFLECTIVE FILM MASK BLANK AND MASK

by SHOKI TSUTOMU, ORIHARA TOSHIHIKO, KAWAHARA AKIHIRO
Year of Publication 03.07.2019

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MANUFACTURING METHOD OF SUBSTRATE HAVING FUNCTIONAL FILM, MANUFACTURING METHOD OF SUBSTRATE HAVING MULTILAYER FILM, MANUFACTURING METHOD OF MASK BLANK, AND MANUFACTURING METHOD OF MASK FOR TRANSFER

by SHOKI TSUTOMU, ORIHARA TOSHIHIKO
Year of Publication 22.06.2015

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SUBSTRATE PROVIDED WITH MULTILAYER REFLECTIVE FILM, MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD

by ORIHARA, TOSHIHIKO, HAMAMOTO, KAZUHIRO
Year of Publication 02.04.2015

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METHOD OF PRODUCING SUBSTRATE, METHOD OF PRODUCING SUBSTRATE FOR MASK BLANK, METHOD OF PRODUCING MASK BLANK, METHOD OF PRODUCING MASK FOR TRANSFER AND SUBSTRATE PRODUCTION APPARATUS

by SHOKI TSUTOMU, ORIHARA TOSHIHIKO
Year of Publication 12.02.2015

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SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD FOR PRODUCING REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

by ORIHARA TOSHIHIKO, ONOUE TAKAHIRO
Year of Publication 04.12.2014

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METHOD OF MANUFACTURING SUBSTRATE FOR MASK BLANK FOR EUV LITHOGRAPHY, METHOD OF MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV LITHOGRAPHY, METHOD OF MANUFACTURING MASK BLANK FOR EUV LITHOGRAPHY, AND METHOD OF MANUFACTURING TRANSFER MASK FOR EUV LITHOGRAPHY

by ORIHARA TOSHIHIKO, NISHIMURA TAKAHITO
Year of Publication 23.10.2014

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GLASS SUBSTRATE FOR MASK BLANK, SUBSTRATE WITH MULTILAYER REFLECTION FILM, MASK BLANK AND MASK

by SHOKI TSUTOMU, ORIHARA TOSHIHIKO, KAWAHARA AKIHIRO
Year of Publication 10.05.2018

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MANUFACTURING METHOD OF SUBSTRATE FOR MASK BLANK, MANUFACTURING METHOD OF SUBSTRATE WITH MULTILAYER FILM, MANUFACTURING METHOD OF MASK BLANK, MANUFACTURING METHOD OF MASK FOR TRANSFER AND SUBSTRATE MANUFACTURING DEVICE FOR MASK BLANK

by SHOKI TSUTOMU, ORIHARA TOSHIHIKO, HAMAMOTO KAZUHIRO
Year of Publication 07.09.2017

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SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD FOR PRODUCING REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

by ORIHARA, TOSHIHIKO, ONOUE, TAKAHIRO
Year of Publication 26.09.2013

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METHOD FOR MANUFACTURING SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD FOR MANUFACTURING MASK BLANK AND METHOD FOR MANUFACTURING MASK FOR TRANSFER

by YAMADA TAKAYUKI, ORIHARA TOSHIHIKO, NISHIMURA TAKAHITO
Year of Publication 10.11.2016

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SUBSTRATE FOR MASK BLANK SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK REFLECTIVE MASK TRANSMISSIVE MASK BLANK TRANSMISSIVE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

by KOZAKAI HIROFUMI, SHOKI TSUTOMU, HORIKAWA JUNICHI, ORIHARA TOSHIHIKO, USUI YOUICHI, HAMAMOTO KAZUHIRO
Year of Publication 10.01.2020

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SUBSTRATE FOR MASK BLANK SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE TYPE MASK BLANK REFLECTIVE TYPE MASK MANUFACTURING METHOD OF SUBSTRATE FOR MASK BLANK AND MANUFACTURING METHOD OF SUBSTRATE WITH MULTILAYER REFLECTIVE FILM AS WELL AS MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

by SHOKI TSUTOMU, HORIKAWA JUNICHI, ORIHARA TOSHIHIKO, HAMAMOTO KAZUHIRO
Year of Publication 25.10.2017

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MASK BLANK SUBSTRATE PROCESSING DEVICE, MASK BLANK SUBSTRATE PROCESSING METHOD, MASK BLANK SUBSTRATE FABRICATION METHOD, MASK BLANK FABRICATION METHOD, AND TRANSFER MASK FABRICATION METHOD

by YAMADA TAKEYUKI, ORIHARA TOSHIHIKO, NISHIMURA TAKAHITO
Year of Publication 26.08.2015

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