Assessment of genetic diversity in Coho salmon (Oncorhynchus kisutch) populations with no family records using ddRAD-seq
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Published in BMC research notes (02.08.2018)
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X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
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Published in Applied physics express (01.06.2008)
Published in Applied physics express (01.06.2008)
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Utsumi, Yoshiyuki, Seshimo, Takehiro, Komuro, Yoshitaka, Kawaue, Akiya, Ishiduka, Keita, Matsuzawa, Kensuke, Hada, Hideo, Onodera, Junichi
Published in Japanese Journal of Applied Physics (01.06.2009)
Published in Japanese Journal of Applied Physics (01.06.2009)
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Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
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Published in Japanese Journal of Applied Physics (01.07.2005)
Published in Japanese Journal of Applied Physics (01.07.2005)
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New Photoresist Based on Amorphous Low Molecular Weight Polyphenols
Hirayama, Taku, Daiju, Shiono, Hada, Hideo, Onodera, Junichi, Ueda, Mitsuru
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Performance of molecular resist based on polyphenol in EUV lithography
Oizumi, Hiroaki, Kumasaka, Fumiaki, Tanaka, Yuusuke, Hirayama, Taku, Shiono, Daiju, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Conference Proceeding
Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films
Fukuyama, Takehiro, Kozawa, Takahiro, Okamoto, Kazumasa, Tagawa, Seiichi, Irie, Makiko, Mimura, Takeyoshi, Iwai, Takeshi, Onodera, Junichi, Hirosawa, Ichiro, Koganesawa, Tomoyuki, Horie, Kazuyuki
Published in Japanese Journal of Applied Physics (01.06.2009)
Published in Japanese Journal of Applied Physics (01.06.2009)
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Patterning capability of new molecular resist in EUV lithography
Oizumi, Hiroaki, Tanaka, Yuusuke, Kumise, Takaaki, Shiono, Daiju, Hirayama, Taku, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Conference Proceeding
Depth profile and line-edge roughness of partially O-1-ethoxyethylated low molecular weight amorphous polyphenol and poly(p-hydroxystyrene) base resists for electron-beam lithography
Hirayama, Taku, Shiono, Daiju, Onodera, Junichi, Yamaguchi, Atsuko, Fukuda, Hiroshi
Published in Polymers for advanced technologies (01.02.2006)
Published in Polymers for advanced technologies (01.02.2006)
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Dissolution Kinetics in Chemically Amplified EUV Resist
Yamamoto, Hiroki, Kozawa, Takahiro, Tagawa, Seiichi, Mimura, Takeyoshi, Iwai, Takeshi, Onodera, Junichi
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Evaluation of New Molecular Resist for EUV Lithography
Oizumi, Hiroaki, Tanaka, Yuusuke, Kumise, Takaaki, Shiono, Daiju, Hirayama, Taku, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atusko, Nishiyama, Iwao
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists
Fukuyam, Takehiro, Kozawa, Takahiro, Yamamoto, Hiroki, Tagawa, Seiichi, Irie, Makiko, Mimura, Takeyoshi, Iwai, Takeshi, Onodera, Junichi, Hirosawa, Ichiro, Koganesawa, Tomoyuki, Horie, Kazuyuki
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Characterization of Negative-Tone Molecular Resist for EUV and EB Lithography
Kojima, Kyoko, Mori, Shigeki, Shiono, Daiju, Hada, Hideo, Onodera, Junichi
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Negative-Tone Polyphenol Resist using Intramolecular-Esterification Reaction for sub-50 nm Lithography
Kojima, Kyoko, Hattori, Takashi, Fukuda, Hiroshi, Hirayama, Taku, Shiono, Daiji, Hada, Hideo, Onodera, Junichi
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Study of PAG Material Design for ArF Immersion Photoresist
Utsumi, Yoshiyuki, Komoro, Yoshitaka, Kawaue, Akira, Seshimo, Takehiro, Hada, Hideo, Nakamura, Tsuyoshi, Yoshii, Yasuhiro, Onodera, Junichi, Ogawa, Satoshi
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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Evaluation of Resist Capability for EUV Lithography
Oizumi, Hiroaki, Tanaka, Yusuke, Shiono, Daiji, Hirayama, Taku, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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