A New Stacked-Mask Process Utilizing Spun-on Carbon Film for Sub-130-nm Etching
Abe, Junko, Hayashi, Hisataka, Kishigami, Daizo, Sato, Yasuhiko, Shiobara, Eishi, Shibata, Tsuyoshi, Onishi, Yasunobu, Ohiwa, Tokuhisa
Published in Japanese Journal of Applied Physics (01.10.2003)
Published in Japanese Journal of Applied Physics (01.10.2003)
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Journal Article
Pattern Transfer Process Using Spun-on Carbon Film for KrF and ArF Lithography
Sato, Yasuhiko, Shiobara, Eishi, Matsunaga, Kentaro, Shibata, Tsuyoshi, Abe, Junko, Hayashi, Hisataka, Ohiwa, Tokuhisa, Kasai, Mayumi, Hachiya, Takayo, Onishi, Yasunobu
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Effect of Re-sticking Acid on Resist Profile
Shiobara, Eishi, Kawamura, Daisuke, Matsunaga, Kentaro, Onishi, Yasunobu
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Development Process for Chemically Amplified Resist by KrF Imaging
Matsunaga, Kentaro, Kawamura, Daisuke, Mimotogi, Shoji, Azuma, Tsukasa, Onishi, Yasunobu
Published in Japanese Journal of Applied Physics (01.12.1998)
Published in Japanese Journal of Applied Physics (01.12.1998)
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Journal Article
Deep UV Photoresist Containing Ortho‐Nitrobenzylsilylether Structure in the Main Chain
Hayase, Shuzi, Onishi, Yasunobu, Horiguchi, Rumiko
Published in Journal of the Electrochemical Society (01.09.1987)
Published in Journal of the Electrochemical Society (01.09.1987)
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Journal Article
Sub-55 nm Etch Process Using Stacked-Mask Process
Sakai, Itsuko, Abe, Junko, Hayashi, Hisataka, Taniguchi, Yasuyuki, Kato, Hirokazu, Onishi, Yasunobu, Ohiwa, Tokuhisa
Published in Japanese Journal of Applied Physics (01.07.2007)
Published in Japanese Journal of Applied Physics (01.07.2007)
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Journal Article
ACID CATALYZED RESIST FOR KrF EXCIMER LASER LITHOGRAPHY (2) POLYMER DISSOLUTION INHIBITORS
ONISHI, YASUNOBU, OYASATO, NAOHIKO, NIKI, HIROKAZU, HAYASE, RUMIKO HORIGUCHI, KOBAYASHI, YOSHIHITO, SATO, KAZUO, MIYAMURA, MASATAKA
Published in Journal of Photopolymer Science and Technology (1992)
Published in Journal of Photopolymer Science and Technology (1992)
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