Improving thickness uniformity of sputter-deposited films by using magnet rotation speed control technique
Miura, Tatsuhiko, Takita, Shota, Usuki, Makoto, Omoto, Seiichi, Nakagawa, Takashi, Sato, Tsutomu, Shiba, Katsuyasu
Published in 2018 International Symposium on Semiconductor Manufacturing (ISSM) (01.12.2018)
Published in 2018 International Symposium on Semiconductor Manufacturing (ISSM) (01.12.2018)
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