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"OLICH JAROSLAV"
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"OLICH JAROSLAV"
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Ion implanted doped layer production, for shallow doping profile production in a highly integrated circuit, comprises subjecting a semiconductor wafer to ultrasound during implantation
by
OLICH
,
JAROSLAV
Year of Publication
31.05.2000
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Method of fabricating ion implanted doping layers in semiconductor materials and integrated circuits made therefrom
by
Krueger, Dietmar
,
Kurps, Rainer
,
Romanjuk, Boris
,
Melnik, Viktor
,
Olich
,
Jaroslav
Year of Publication
19.03.2002
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Method of fabricating ion implanted doping layers in semiconductor materials and integrated circuits made therefrom
by
KURPS RAINER
,
KRUEGER DIETMAR
,
ROMANJUK BORIS
,
OLICH JAROSLAV
,
MELNIK VIKTOR
Year of Publication
19.03.2002
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basic electric elements
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