Fabrication of advanced La-incorporated Hf-silicate gate dielectrics using physical-vapor-deposition-based in situ method and its effective work function modulation of metal/high- k stacks
Arimura, Hiroaki, Oku, Yudai, Saeki, Masayuki, Kitano, Naomu, Hosoi, Takuji, Shimura, Takayoshi, Watanabe, Heiji
Published in Journal of applied physics (01.02.2010)
Published in Journal of applied physics (01.02.2010)
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Journal Article
Electronic structure characterization of La incorporated Hf-based high-k gate dielectrics by NEXAFS
Yamamoto, Takashi, Ogawa, Singo, Kunisu, Masahiro, Tsuji, Junichi, Kita, Koji, Saeki, Masayuki, Oku, Yudai, Arimura, Hiroaki, Kitano, Naomu, Hosoi, Takuji, Shimura, Takayoshi, Watanabe, Heiji
Published in Journal of nanoscience and nanotechnology (01.04.2011)
Published in Journal of nanoscience and nanotechnology (01.04.2011)
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Journal Article
METHOD FOR MANUFACTURING WELDED LIGHT-WEIGHT H-SHAPED STEEL
HARAZONO MANABU, HIRAYAMA KENTARO, MATSUMOTO MINORU, OKU YUDAI, UKIDA TAKAFUMI
Year of Publication 08.11.2018
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Year of Publication 08.11.2018
Patent
Structural optimization of HfTiSiO high- k gate dielectrics by utilizing in-situ PVD-based fabrication method
Arimura, Hiroaki, Horie, Shinya, Oku, Yudai, Minami, Takashi, Kitano, Naomu, Kosuda, Motomu, Hosoi, Takuji, Shimura, Takayoshi, Watanabe, Heiji
Published in Applied surface science (30.07.2008)
Published in Applied surface science (30.07.2008)
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Journal Article
Dielectric and Interface Properties of TiO2/HfSiO/SiO2 Layered Structures Fabricated by in situ PVD Method
Arimura, Hiroaki, Naitou, Yuichi, Kitano, Naomu, Oku, Yudai, Yamaguchi, Nobuo, Kosuda, Motomu, Hosoi, Takuji, Shimura, Takayoshi, Watanabe, Heiji
Published in ECS transactions (03.10.2008)
Published in ECS transactions (03.10.2008)
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Journal Article
Structural optimization of HfTiSiO high-κ gate dielectrics by utilizing in-situ PVD-based fabrication method
ARIMURA, Hiroaki, HORIE, Shinya, OKU, Yudai, MINAMI, Takashi, KITANO, Naomu, KOSUDA, Motomu, HOSOI, Takuji, SHIMURA, Takayoshi, WATANABE, Heiji
Published in Applied surface science (2008)
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Published in Applied surface science (2008)
Conference Proceeding
Dielectric and Interface Properties of TiO2/HfSiO/SiO2 Layered Structures Fabricated by in situ PVD Method
Arimura, Hiroaki, Naitou, Yuichi, Kitano, Naomu, Oku, Yudai, Yamaguchi, Nobuo, Kosuda, Motomu, Hosoi, Takuji, Shimura, Takayoshi, Watanabe, Heiji
Published in Meeting abstracts (Electrochemical Society) (29.08.2008)
Published in Meeting abstracts (Electrochemical Society) (29.08.2008)
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Journal Article