Enhancing electrical properties of nickel silicide by using spike anneal as the second rapid thermal anneal
Futase, Takuya, Okada, Shigenari, Hashikawa, Naoto, Kamino, Takeshi, Inaba, Yutaka, Fujiwara, Tetsuo, Suzuki, Tadashi, Yamamoto, Hirohiko, Kozawa, Hidehiko
Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
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Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
Conference Proceeding