Challenges of future high-precision polishing methods for hard-to-process materials by the fusion of environmental control and plasma technology
K. Toshiro DOI, Hideo AIDA, Osamu OHNISHI, Shaohui YIN, Yinghui REN
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Published in Jin gang shi yu mo liao mo ju gong cheng (01.12.2022)
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Effects of Atmosphere and Ultraviolet Light Irradiation on Chemical Mechanical Polishing Characteristics of SiC Wafers
Ohnishi, Osamu, Doi, Toshiro, Kurokawa, Syuhei, Yamazaki, Tsutomu, Uneda, Michio, Yin, Tao, Koshiyama, Isamu, Ichikawa, Koichiro, Aida, Hideo
Published in Japanese Journal of Applied Physics (01.05.2012)
Published in Japanese Journal of Applied Physics (01.05.2012)
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Journal Article
Real-Time Evaluation of Tool Flank Wear by In-Process Contact Resistance Measurement in Face Milling
MURATA, Mitsuaki, KUROKAWA, Syuhei, OHNISHI, Osamu, UNEDA, Michio, DOI, Toshiro
Published in Journal of Advanced Mechanical Design, Systems, and Manufacturing (01.01.2012)
Published in Journal of Advanced Mechanical Design, Systems, and Manufacturing (01.01.2012)
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Wear Resistance of Coating Films on Hob Teeth
UMEZAKI, Yoji, FUNAKI, Yoshiyuki, KUROKAWA, Syuhei, OHNISHI, Osamu
Published in Journal of advanced mechanical design, systems, and manufacturing (01.01.2012)
Published in Journal of advanced mechanical design, systems, and manufacturing (01.01.2012)
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Journal Article
Performance Evaluation Method of Chemical Mechanical Polishing Pad Conditioner Using Digital Image Correlation Processing
Uneda, Michio, Omote, Tatsunori, Ishikawa, Ken-ichi, Ichikawa, Koichiro, Doi, Toshiro, Kurokawa, Syuhei, Ohnishi, Osamu
Published in Japanese Journal of Applied Physics (01.05.2012)
Published in Japanese Journal of Applied Physics (01.05.2012)
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Journal Article
Dependence of GaN Removal Rate of Plasma Chemical Vaporization Machining on Mechanically Introduced Damage
Sano, Yasuhisa, Doi, Toshiro K, Kurokawa, Syuhei, Aida, Hideo, Ohnishi, Osamu, Uneda, Michio, Shiozawa, Kousuke, Okada, Yu, Yamauchi, Kazuto
Published in Sensors and materials (2014)
Published in Sensors and materials (2014)
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Journal Article
Performance Evaluation Method of Chemical Mechanical Polishing Pad Conditioner Using Digital Image Correlation Processing
Uneda, Michio, Omote, Tatsunori, Ishikawa, Ken-ichi, Ichikawa, Koichiro, Doi, Toshiro, Kurokawa, Syuhei, Ohnishi, Osamu
Published in Japanese Journal of Applied Physics (01.05.2012)
Published in Japanese Journal of Applied Physics (01.05.2012)
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Journal Article
Effects of Atmosphere and Ultraviolet Light Irradiation on Chemical Mechanical Polishing Characteristics of SiC Wafers
Ohnishi, Osamu, Doi, Toshiro, Kurokawa, Syuhei, Yamazaki, Tsutomu, Uneda, Michio, Yin, Tao, Koshiyama, Isamu, Ichikawa, Koichiro, Aida, Hideo
Published in Japanese Journal of Applied Physics (01.05.2012)
Published in Japanese Journal of Applied Physics (01.05.2012)
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Journal Article
Quantitative Evaluation of Slurry Flow Behavior Using Digital Image Processing
UNEDA, Michio, MURATA, Shintaro, NARISE, Takashi, YAMAZAKI, Tsutomu, OHNISHI, Osamu, KUROKAWA, Syuhei, ISHIKAWA, Ken-ichi, DOI, Toshiro
Published in TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C (2011)
Published in TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C (2011)
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Preparation and characterization of composite coatings containing a quaternary ammonium salt as an anti-static agent
Kugimoto, Yuki, Wakabayashi, Atsumi, Dobashi, Toshiaki, Ohnishi, Osamu, Doi, Toshiro K., Kurokawa, Syuhei
Published in Progress in organic coatings (01.03.2016)
Published in Progress in organic coatings (01.03.2016)
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Development of a laser-guiding-type deep small-sized hole-measurement system: Measurement accuracy
Katsuki, Akio, Sajima, Takao, Murakami, Hiroshi, Hazrat, Ali Md, Ohnishi, Osamu, Akashi, Kouji
Published in Precision engineering (01.05.2020)
Published in Precision engineering (01.05.2020)
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