Impact of Gate Poly Depletion on Evaluation of Channel Temperature in Silicon-on-Insulator Metal–Oxide–Semiconductor Field-Effect Transistors with Four-Point Gate Resistance Measurement Method
Beppu, Nobuyasu, Takahashi, Tsunaki, Ohashi, Teruyuki, Uchida, Ken
Published in Japanese Journal of Applied Physics (01.02.2012)
Published in Japanese Journal of Applied Physics (01.02.2012)
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Journal Article
MANUFACTURING SUPPORT SYSTEM
KAKO, TETSUYA, OHASHI, TERUYUKI, ISHIKAWA, KOHEI, TAKAHASHI, HIROTAKA
Year of Publication 16.07.2015
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Year of Publication 16.07.2015
Patent