Search Results - "OH SEUNGHO" :: K.UTB vyhledávací portál

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MICRO-FEATURE FILL PROCESS AND APPARATUS USING HEXACHLORODISILANE OR OTHER CHLORINE-CONTAINING SILICON PRECURSOR

by OH, SEUNGHO, LEITH, ALLEN, DIP, ANTHONY
Year of Publication 10.10.2007

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LOW-TEMPERATURE OXIDE REMOVAL USING FLUORINE

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 30.08.2007

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A METHOD AND SYSTEM FOR REMOVING AN OXIDE FROM A SUBSTRATE

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 16.08.2007

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Silicon germanium surface layer for high-k dielectric integration

by ROY PRADIP K, OH SEUNGHO, LEITH ALLEN J, JOE RAYMOND, DIP ANTHONY, KAUSHAL SANJEEV
Year of Publication 15.06.2010

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SEQUENTIAL DEPOSITION PROCESS FOR FORMING Si-CONTAINING FILMS

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 18.05.2007

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Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor

by LEITH ALLEN JOHN, OH SEUNGHO, DIP ANTHONY
Year of Publication 17.04.2007

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INTERRUPTED DEPOSITION PROCESS FOR SELECTIVE DEPOSITION OF SI-CONTAINING FILMS

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 08.03.2007

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Interrupted deposition process for selective deposition of Si-containing films

by OH SEUNGHO, LEITH ALLEN J, DIP ANTHONY
Year of Publication 01.03.2007

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Low temperature formation of patterned epitaxial Si containing films

by OH SEUNGHO, LEITH ALLEN J, DIP ANTHONY
Year of Publication 22.02.2007

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LOW-TEMPERATURE OXIDE REMOVAL USING FLUORINE

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 22.02.2007

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Sequential deposition process for forming Si-containing films

by OH SEUNGHO, LEITH ALLEN J, DIP ANTHONY
Year of Publication 22.02.2007

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SEQUENTIAL DEPOSITION PROCESS FOR FORMING Si-CONTAINING FILMS

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 22.02.2007

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LOW TEMPERATURE FORMATION OF PATTERNED EPITAXIAL SI CONTAINING FILMS

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 22.02.2007

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Low-temperature oxide removal using fluorine

by OH SEUNGHO, LEITH ALLEN J, DIP ANTHONY
Year of Publication 22.02.2007

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MICRO-FEATURE FILL PROCESS AND APPARATUS USING HEXACHLORODISILANE OR OTHER CHLORINE-CONTAINING SILICON PRECURSOR

by OH, SEUNGHO, LEITH, ALLEN, DIP, ANTHONY
Year of Publication 07.12.2006

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DEPOSITION OF SILICON-CONTAINING FILMS FROM HEXACHLORODISILANE

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 09.11.2006

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Method and system for removing an oxide from a substrate

by OH SEUNGHO, LEITH ALLEN J, DIP ANTHONY
Year of Publication 12.10.2006

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A METHOD AND SYSTEM FOR REMOVING AN OXIDE FROM A SUBSTRATE

by OH, SEUNGHO, LEITH, ALLEN, JOHN, DIP, ANTHONY
Year of Publication 05.10.2006

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MICRO-FEATURE FILL PROCESS AND APPARATUS USING HEXACHLORODISILANE OR OTHER CHLORINE-CONTAINING SILICON PRECURSOR

by OH, SEUNGHO, LEITH, ALLEN, DIP, ANTHONY
Year of Publication 27.07.2006

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Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor

by OH SEUNGHO, LEITH ALLEN J, DIP ANTHONY
Year of Publication 20.07.2006

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