Silicon Nitride Molecular Layer Deposition Process Development using Dichlorosilane and Ammonia
O'Meara, David L., Matsushita, Kaoru, Hasebe, Kazuhide, Dip, Anthony, Mo, Renee, Higgins, Paul, Maku, Shingo, Chudzik, Michael, Gribelyuk, Michael, Tai, Leo
Published in ECS transactions (18.07.2007)
Published in ECS transactions (18.07.2007)
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Journal Article
PVD TiN metal gate MOSFETs on bulk silicon and fully depleted silicon-on-insulator (FDSOI) substrates for deep sub-quarter micron CMOS technology
Maiti, B., Tobin, P.J., Hobbs, C., Hegde, R.I., Huang, F., O'Meara, D.L., Jovanovic, D., Mendicino, M., Chen, J., Connelly, D., Adetutu, O., Mogab, J., Candelaria, J., La, L.B.
Published in International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) (1998)
Published in International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) (1998)
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Conference Proceeding