PREPARATION METHOD OF SUBSTRATE FOR PHOTOMASK BLANK COMPRISING POLISHING SUBSTRATE CIRCULAR PLATE TO ALLOW MAIN SURFACE REGION OF SUBSTRATE TO HAVE SPECIFIC FLATNESS FOR PROVIDING POLISHED INTERMEDIATE PRODUCT, AND MORE POLISHING THE POLISHED INTERMEDIATE PRODUCT
NUMANAMI, TSUNEO, KONDO, NAOTO, HAGIWARA, TSUNEYUKI, NAKATSU, MASAYUKI, MOGI, MASAYUKI
Year of Publication 02.02.2005
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Year of Publication 02.02.2005
Patent
SUBSTRATE FOR PHOTOMASK BLANK OF RECTANGLE WITH SIDE OF AT LEAST 6 INCH USED TO EXPOSE PATTERN HAVING MINIMUM CHARACTERISTIC SIZE, AND PHOTOMASK PREPARED FROM THE SUBSTRATE
NUMANAMI, TSUNEO, ITOH, MASAMITSU, KONDO, NAOTO, HAGIWARA, TSUNEYUKI, NAKATSU, MASAYUKI, MOGI, MASAYUKI
Year of Publication 02.02.2005
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Year of Publication 02.02.2005
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Phase Shift Mask Blank and Phase Shift Mask and Method of Manufacture
INAZUKI YUKIO, OKAZAKI SATOSHI, TAJIKA ATSUSHI, KANEKO HIDEO, NAKATSU MASAYUKI, NUMANAMI TSUNEO
Year of Publication 15.02.2003
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Year of Publication 15.02.2003
Patent