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Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon

by Wagenpfeil, M., Schneider, J., Murra, M., Schulte, D., Weinheimer, C., Michel, T., Anton, G., Adhikari, G., Al Kharusi, S., Angelico, E., Arnquist, I.J., Beck, D., Bolotnikov, A., Breur, P.A., Brown, E., Brunner, T., Caden, E., Chernyak, D., Craycraft, A., Daniels, T., Darroch, L., de St. Croix, A., Deslandes, K., Di Vacri, M.L., Dolinski, M.J., Echevers, J., Elbeltagi, M., Ferrara, S., Feyzbakhsh, S., Gallina, G., Giacomini, G., Gingras, C., Goeldi, D., Gorham, A., Gornea, R., Gratta, G., Hansen, E.V., Hardy, C.A., Heffner, M., Hoppe, E.W., House, A., Jamil, A., Jewell, M., Karelin, A., Kaufman, L.J., Kuchenkov, A., Kumar, K.S., Lan, Y., Leach, K.G., Leonard, D.S., Li, G., Licciardi, C., Lindsay, R., MacLellan, R., Massacret, N., McElroy, T., Medina Peregrina, M., Mong, B., Moore, D.C., Murray, K., Nattress, J., Natzke, C.R., Newby, R.J., Nolet, F., Nusair, O., Nzobadila Ondze, J.C., Odgers, K., Odian, A., Orrell, J.L., Overman, C.T., Piepke, A., Pratte, J.-F., Raguzin, E., Ramonnye, G.J., Retière, F., Richard, C., Richman, M., Ringuette, J., Robinson, A., Rossignol, T., Saldanha, R., Soma, A.K., Spadoni, F., Stekhanov, V., Stiegler, T., Tarka, M., Thibado, S., Tidball, A., Todd, J., Totev, T., Triambak, S., Tsang, R., Viel, S., Vivo-Vilches, C., Walent, M., Worcester, M., Wu, S.X., Yan, W., Yang, L., Zeldovich, O.
Published in Journal of instrumentation (01.08.2021)

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