Advanced Process Control Using Virtual Metrology to Cope with Etcher Condition Change
Umeda, Shota, Nogi, Keita, Shiraishi, Daisuke, Kagoshima, Akira
Published in 2018 International Symposium on Semiconductor Manufacturing (ISSM) (01.12.2018)
Published in 2018 International Symposium on Semiconductor Manufacturing (ISSM) (01.12.2018)
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Conference Proceeding
Real-Time Transfer Control Method for Linear Tools
Nogi, Keita, Nakata, Teruo, Kondo, Hideaki, Inoue, Satomi
Published in IEEE transactions on semiconductor manufacturing (01.08.2013)
Published in IEEE transactions on semiconductor manufacturing (01.08.2013)
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Journal Article
Conference Proceeding
VACUUM PROCESSING APPARTUS AND VACUUM PROCESSING METHOD
NAKATA TERUO, NOGI KEITA, SUEMITSU YOSHIRO, KAWAGUCHI MICHINORI, TAMAI KENJI
Year of Publication 21.04.2014
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Year of Publication 21.04.2014
Patent