A triple channel HEMT on InP (Camel HEMT) for large-signal high-speed applications
Maher, H., Decobert, J., Falcou, A., Le Pallec, M., Post, G., Nissim, Y.I., Scavennec, A.
Published in IEEE transactions on electron devices (01.01.1999)
Published in IEEE transactions on electron devices (01.01.1999)
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Journal Article
Tunable UV-flash krypton lamp array useful for large area deposition and in situ UV annealing of Si-based dielectrics
Flicstein, J., Vitel, Y., Dulac, O., Debauche, C., Nissim, Y.I., Licoppe, C.
Published in Applied surface science (01.02.1995)
Published in Applied surface science (01.02.1995)
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Conference Proceeding
Light-assisted deposition of silicon-based dielectrics for optical interconnection in optoelectronics
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Journal Article
Conference Proceeding
Integration of plasma cleaning and light-assisted CVD for the passivation of III–V semiconductor surfaces
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Conference Proceeding
Temperature distributions produced in semiconductors by a scanning elliptical or circular cw laser beam
Nissim, Y. I., Lietoila, A., Gold, R. B., Gibbons, J. F.
Published in Journal of applied physics (01.01.1980)
Published in Journal of applied physics (01.01.1980)
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Journal Article
Rapid thermal chemical vapour deposition of SiOxNy films
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Conference Proceeding
Journal Article
Photo-assisted deposition of thin films on III–V semiconductors with UV and IR lamps
Nissim, Y.I., Moison, J.M., Houzay, F., Lebland, F., Licoppe, C., Bensoussan, M.
Published in Applied surface science (01.12.1990)
Published in Applied surface science (01.12.1990)
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Journal Article
Conference Proceeding
Bulk and surface properties of RTCVD Si3N4 films for optical device applications
LEBLAND, F, WANG, Z. Z, FLICSTEIN, J, LICOPPE, C, NISSIM, Y. I
Published in Applied surface science (01.05.1993)
Published in Applied surface science (01.05.1993)
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Conference Proceeding
Journal Article
Interface structure evolution and impurity effects during solid-phase-epitaxial growth in GaAs
LICOPPE, C, NISSIM, Y. I, MERIADEC, C, KRAUZ, P
Published in Journal of applied physics (15.08.1986)
Published in Journal of applied physics (15.08.1986)
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Journal Article
Differences in the SiO2/InP interfaces obtained by thermal and UV-induced chemical vapour deposition
LICOPPE, C, DEBAUCHE, C, HOUZAY, F, FLICSTEIN, J, NISSIM, Y. I, MOISON, J. M
Published in Applied surface science (1992)
Published in Applied surface science (1992)
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Conference Proceeding
Journal Article
Thermal and photon-assisted interaction of ammonia, silane and oxygen with indium phosphide substrates
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Conference Proceeding
Dielectric waveguides fabricated on InP by photochemical process for OEICs
Sayah, A., Nissim, Y.I.
Published in Seventh International Conference on Indium Phosphide and Related Materials (1995)
Published in Seventh International Conference on Indium Phosphide and Related Materials (1995)
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Conference Proceeding
Cw laser processing of semiconductor surfaces
MOISON, J. M, LICOPPE, C, NISSIM, Y. I, HOUZAY, F
Published in Journal of applied physics (01.04.1986)
Published in Journal of applied physics (01.04.1986)
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Journal Article
cw laser assisted diffusion and activation of tin in GaAs from a SnO2/SiO2 source
Nissim, Y. I., Gibbons, J. F., Magee, T. J., Ormond, R.
Published in Journal of applied physics (01.01.1981)
Published in Journal of applied physics (01.01.1981)
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