Characterization of Strain for High-Performance Metal–Oxide–Semiconductor Field-Effect-Transistor
Kosemura, Daisuke, Kakemura, Yasuto, Yoshida, Tetsuya, Ogura, Atsushi, Kohno, Masayuki, Nishita, Tatsuo, Nakanishi, Toshio
Published in Japanese Journal of Applied Physics (01.04.2008)
Published in Japanese Journal of Applied Physics (01.04.2008)
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Journal Article
Study of Strain Induction for Metal–Oxide–Semiconductor Field-Effect Transistors using Transparent Dummy Gates and Stress Liners
Kosemura, Daisuke, Takei, Munehisa, Nagata, Kohki, Akamatsu, Hiroaki, Kohno, Masayuki, Nishita, Tatsuo, Nakanishi, Toshio, Ogura, Atsushi
Published in Japanese Journal of Applied Physics (01.06.2009)
Published in Japanese Journal of Applied Physics (01.06.2009)
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Journal Article
Study of Charge Trap Sites in SiN Films by Hard X-ray Photoelectron Spectroscopy
Kosemura, Daisuke, Takei, Munehisa, Nagata, Kohki, Akamatsu, Hiroaki, Hattori, Maki, Katayama, Daisuke, Nishita, Tatsuo, Hirota, Yoshihiro, Machida, Masatake, Son, Jin-Young, Koganezawa, Tomoyuki, Hirosawa, Ichiro, Ogura, Atsushi
Published in Japanese Journal of Applied Physics (01.04.2010)
Published in Japanese Journal of Applied Physics (01.04.2010)
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Journal Article