Large Memory Window Antifuse HfO₂-Based One-Resistor and One-OTP NVMs Featuring Excellent Disturbance Tolerance and Robust 200 °C Retention
Hsieh, Dong-Ru, Ni, Jia-Chian, Yeh, Wei-Ju, Hong, Zi-Yang, Luo, Huai-En, Hsu, Michael, Cho, Ta-Chun, Chao, Tien-Sheng
Published in IEEE transactions on electron devices (01.04.2024)
Published in IEEE transactions on electron devices (01.04.2024)
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Journal Article
Record-High Memory Window and Robust Retention Anti-Fuse OTP Memory: Electrical and Reliability Characteristics
Hsieh, Dong-Ru, Ni, Jia-Chian, Yeh, Wei-Ju, Hong, Tzu-Chieh, Hong, Zi-Yang, Liang, Yan-Kui, Luo, Huai-En, Hsu, Michael, Cho, Ta-Chun, Chao, Tien-Sheng
Published in 2023 Silicon Nanoelectronics Workshop (SNW) (11.06.2023)
Published in 2023 Silicon Nanoelectronics Workshop (SNW) (11.06.2023)
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Conference Proceeding
Investigation of HfO2 and ZrO2 Nanolamination Thickness on Superlattice HZO FeRAMs Exhibiting Enhanced Remnant Polarization and Improved Endurance
Hsieh, Dong-Ru, Hong, Zi-Yang, Yeh, Wei-Ju, Ni, Jia-Chian, Luo, Huai-En, Liang, Yan-Kui, Hsieh, Shang-Lin, Chen, Kuan-Lin, Chao, Tien-Sheng
Published in 2024 IEEE Silicon Nanoelectronics Workshop (SNW) (15.06.2024)
Published in 2024 IEEE Silicon Nanoelectronics Workshop (SNW) (15.06.2024)
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Conference Proceeding
Optimization of Ferroelectricity in Al-Doped HfO2 Capacitors: Electrical and Endurance Characteristics
Hsieh, Dong-Ru, Luo, Huai-En, Ni, Jia-Chian, Hong, Zi-Yang, Chen, Yi-Hsiu, Yeh, Wei-Ju, Chao, Tien-Sheng
Published in 2023 Silicon Nanoelectronics Workshop (SNW) (11.06.2023)
Published in 2023 Silicon Nanoelectronics Workshop (SNW) (11.06.2023)
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Conference Proceeding