Overall Equipment Efficiency (OEE) improvements for lithographic tools in wafer fab
Lee Yen-Fei, Ko Chen-Pin, Chang Hsu-Sheng, Shariff, Muhammad, Ng Kok Hooi, Segar, Chandra, Gopal, Surein
Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
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Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
Conference Proceeding