Study of etching bias modeling and correction strategies for compensation of patterning process effects
Ng, Philip C.W., Tsai, Kuen-Yu, Melvin, Lawrence S.
Published in Microelectronic engineering (01.10.2013)
Published in Microelectronic engineering (01.10.2013)
Get full text
Journal Article
Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography
Ng, Philip C. W, Chien, Sheng-Wei, Chang, Bo-Sen, Tsai, Kuen-Yu, Lu, Yi-Chang, Li, Jia-Han, Chen, Alek C
Published in Japanese Journal of Applied Physics (01.06.2011)
Published in Japanese Journal of Applied Physics (01.06.2011)
Get full text
Journal Article
A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects
Kuen-Yu Tsai, Meng-Fu You, Yi-Chang Lu, Ng, P.
Published in 2008 IEEE/ACM International Conference on Computer-Aided Design (01.11.2008)
Published in 2008 IEEE/ACM International Conference on Computer-Aided Design (01.11.2008)
Get full text
Conference Proceeding