Selective Pulsed Chemical Vapor Deposition of Water-Free TiO2/Al2O3 and HfO2/Al2O3 Nanolaminates on Si and SiO2 in Preference to SiCOH
Huang, James, Cho, Yunil, Zhang, Zichen, Jan, Antony, Wong, Keith T, Nemani, Srinivas D, Yieh, Ellie, Kummel, Andrew C
Published in ACS applied materials & interfaces (06.04.2022)
Published in ACS applied materials & interfaces (06.04.2022)
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Journal Article
Selective Pulsed Chemical Vapor Deposition of Water-Free TiO 2 /Al 2 O 3 and HfO 2 /Al 2 O 3 Nanolaminates on Si and SiO 2 in Preference to SiCOH
Huang, James, Cho, Yunil, Zhang, Zichen, Jan, Antony, Wong, Keith T, Nemani, Srinivas D, Yieh, Ellie, Kummel, Andrew C
Published in ACS applied materials & interfaces (06.04.2022)
Published in ACS applied materials & interfaces (06.04.2022)
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Journal Article
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Year of Publication 15.03.2024
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Year of Publication 31.01.2024
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Year of Publication 20.09.2022
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Year of Publication 15.07.2022
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Year of Publication 05.07.2022
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Year of Publication 05.07.2022
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