The Physics of EUV Photoresist and How It Drives Strategies for Improvement
Mark, Neisser, Cho, Kyoungyong, Petrillo, Karen
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Oxide Nanoparticle EUV (ONE) Photoresists: Current Understanding of the Unusual Patterning Mechanism
Jiang, Jing, Zhang, Ben, Yu, Mufei, Li, Li, Neisser, Mark, Chun, Jun Sung, Giannelis, Emmanuel P., Ober, Christopher K.
Published in Journal of Photopolymer Science and Technology (01.01.2015)
Published in Journal of Photopolymer Science and Technology (01.01.2015)
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Journal Article
EUV Research Activity at SEMATECH
Neisser, Mark, Jen, Shih-Hui, Chun, Jun Sung, Antohe, Alin, He, Long, Kearney, Patrick, Goodwin, Frank
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
EUV Resists: Pushing to the Extreme
Naulleau, Patrick, Anderson, Christopher, Chao, Weilun, Bhattarai, Suchit, Neureuther, Andrew, Cummings, Kevin, Jen, Shi-Hui, Neisser, Mark, Thomas, Bryan
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
Enabling EUV Resist Research at the 1x and Smaller Regime
Naulleau, Patrick, Anderson, Christopher, Chao, Weilun, Goldberg, Kenneth, Wojdyla, Antoine, Bhattarai, Suchit, Neureuther, Andrew, Goodwin, Frank, Neisser, Mark
Published in Journal of Photopolymer Science and Technology (01.01.2015)
Published in Journal of Photopolymer Science and Technology (01.01.2015)
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Journal Article
PAG and Quencher Effects on DBARC Performance
Padmanaban, Murirathna, Kudo, Takanori, Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Neisser, Mark, Miyazaki, Shinji, Miyamoto, Kazma, Akiyama, Yasushi, Ishizu, Yuko
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Journal Article
Advances and Challenges in Developable Bottom Anti-Reflective Coating (DBARC)
Kudo, Takanori, Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Antonio, Charito, Parthasarathy, Deepa, Miyazaki, Shinji, Yamamoto, Kazuma, Akiyama, Yasushi, Collett, Richard, Neisser, Mark, Padmanaban, Murirathna
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning
Neisser, Mark, Orji, Ndubuisi G., Levinson, Harry J., Celano, Umberto, Moyne, James, Mashiro, Supika, Wilcox, Dan, Libman, Slava
Published in Computer (Long Beach, Calif.) (01.01.2024)
Published in Computer (Long Beach, Calif.) (01.01.2024)
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Journal Article
Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)
Houlihan, Francis, Miyazaki, Shinji, Dioses, Alberto, Zhang, Lin, Ubayashi, Yuki, Ohta, Kazuyoshi, Oberlander, Joseph, Krawicz, Alexandra, Vasanthan, Sumathy, Li, Meng, Wei, Yayi, Lu, PingHung, Neisser, Mark
Published in Journal of photopolymer science and technology (2008)
Published in Journal of photopolymer science and technology (2008)
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Journal Article
Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings
Houlihan, Francis, Dioses, Alberto, Toukhy, Medhat, Romano, Andrew, Oberlander, Joseph, Wu, HengPeng, Mullen, Salem, Krawicz, Alexandra, Lu, PingHung, Neisser, Mark
Published in Journal of photopolymer science and technology (2007)
Published in Journal of photopolymer science and technology (2007)
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Journal Article
Understanding EUV Shot Noise
Neisser, Mark, Yong Cho, Kyoung, Sarma, Chandra, Petrillo, Karen
Published in Journal of photopolymer science and technology (01.09.2013)
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Published in Journal of photopolymer science and technology (01.09.2013)
Journal Article
NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PROCESSES THEREOF
PAUNESCU MARGARETA, YIN JIAN, NEISSER MARK, CAO YI, HONG SUNGEUN, LIN GUANYANG, WU HENGPENG, POLISHCHUK OREST
Year of Publication 22.04.2019
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Year of Publication 22.04.2019
Patent
Oxide Nanoparticle EUV (ONE) Photoresists
Jiang, Jing, Zhang, Ben, Yu, Mufei, Li, Li, Neisser, Mark, Sung Chun, Jun, P Giannelis, Emmanuel, K Ober, Christopher
Published in Journal of photopolymer science and technology (01.07.2015)
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Published in Journal of photopolymer science and technology (01.07.2015)
Journal Article
EUV Resists
Naulleau, Patrick, Anderson, Christopher, Chao, Weilun, Bhattarai, Suchit, Neureuther, Andrew, Cummings, Kevin, Jen, Shi-Hui, Neisser, Mark, Thomas, Bryan
Published in Journal of photopolymer science and technology (01.11.2014)
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Published in Journal of photopolymer science and technology (01.11.2014)
Journal Article