Planar dual gate oxide LDMOS structures in 180nm power management technology
Sharma, S., Letavic, T., Yun Shi, Loiseau, A., Monaghan, J.-E, Feilchenfeld, N., Phelps, R., Lamothe, C., Cook, D., Dunn, J., Roerher, G., Nauschnig, H., Minixhofer, R.
Published in 2012 24th International Symposium on Power Semiconductor Devices and ICs (01.06.2012)
Published in 2012 24th International Symposium on Power Semiconductor Devices and ICs (01.06.2012)
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