Anodic oxidation of hydrogenated amorphous silicon and properties of oxide
HASEGAWA, H, ARIMOTO, S, NANJO, J, YAMAMOTO, H, OHNO, H
Published in Journal of the Electrochemical Society (01.02.1988)
Published in Journal of the Electrochemical Society (01.02.1988)
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Formation of silicon oxide by the low-temperature process and its application to electron devices
Nomura, Shigeru, Kitamura, Naoko, Yoshino, Masaki, Nanjo, Junji, Ishibe, Shinzo, Kanemaki, Youichi
Published in Electronics & communications in Japan. Part 2, Electronics (1990)
Published in Electronics & communications in Japan. Part 2, Electronics (1990)
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Journal Article