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Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System
by
Zhang, Xinyi
,
Chen, Yuqing
,
Nan
,
Yanbei
,
Li, Yanqiu
Published in
2023 International Workshop on Advanced Patterning Solutions (IWAPS)
(26.10.2023)
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Conference Proceeding
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conferences
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energy resolution
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extreme ultraviolet lithography
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extreme ultraviolet radiation
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illumination
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illumination system design
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English
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IEEE Electronic Library Online
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