Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2
Lasky, J.B., Nakos, J.S., Cain, O.J., Geiss, P.J.
Published in IEEE transactions on electron devices (01.02.1991)
Published in IEEE transactions on electron devices (01.02.1991)
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Journal Article
Gate dielectric integrity and reliability in 0.5- mu m CMOS technology
Strong, A.W., Stamper, A.K., Bolam, R.J., Furukawa, T., Gow, C.J., Gow, T.R., Martin, D.W., Mittl, S.W., Nakos, J.S., Pennington, S.L.
Published in 31st Annual Proceedings Reliability Physics 1993 (1993)
Published in 31st Annual Proceedings Reliability Physics 1993 (1993)
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Conference Proceeding