Dose and Damage Measurements in Low Dose Ion Implantation in Silicon by Photo-Acoustic Displacement and Minority Carrier Lifetime
Washidzu, Gen, Hara, Tohru, Ichikawa, Ryuji, Takamatsu, Hiroyuki, Sumie, Shingo, Nishimoto, Yoshiro, Nakai, Yasuhide, Hashizume, Hidehisa, Miyoshi, Tsunemichi
Published in Japanese Journal of Applied Physics (01.06.1991)
Published in Japanese Journal of Applied Physics (01.06.1991)
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