Characterization of polycrystalline SiC films grown by HW-CVD using silicon tetrafluoride
Abe, Katsuya, Nagasaka, Yohei, Kida, Takahiro, Yamakami, Tomohiko, Hayashibe, Rinpei, Kamimura, Kiichi
Published in Thin solid films (15.01.2008)
Published in Thin solid films (15.01.2008)
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Journal Article
Conference Proceeding
Growth and Characterization of SiC Films by Hot-Wire Chemical Vapor Deposition at Low Substrate Temperature Using SiF 4 /CH 4 /H 2 Mixture
Kida, Takahiro, Nagasaka, Yohei, Sakurai, Takuya, Yamakami, Tomohiko, Hayashibe, Rinpei, Abe, Katsuya, Kamimura, Kiichi
Published in Japanese Journal of Applied Physics (01.01.2008)
Published in Japanese Journal of Applied Physics (01.01.2008)
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Journal Article