Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma
Kamataki, Kunihiro, Nagamatsu, Daiki, Yang, Tao, Abe, Kohei, Yamamoto, Akihiro, Nagao, Iori, Arima, Toshiaki, Otaka, Michihiro, Yamamoto, Yuma, Yamashita, Daisuke, Okumura, Takamasa, Yamashita, Naoto, Itagaki, Naho, Koga, Kazunori, Shiratani, Masaharu
Published in AIP advances (01.08.2022)
Published in AIP advances (01.08.2022)
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Journal Article
Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes: particle-in-cell/Monte Carlo collision model simulation
Abe, Kohei, Kamataki, Kunihiro, Yamamoto, Akihiro, Nagao, Iori, Otaka, Michihiro, Yamashita, Daisuke, Okumura, Takamasa, Yamashita, Naoto, Itagaki, Naho, Koga, Kazunori, Shiratani, Masaharu
Published in Japanese Journal of Applied Physics (01.10.2022)
Published in Japanese Journal of Applied Physics (01.10.2022)
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Journal Article
One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges
Nagao, Iori, Kamataki, Kunihiro, Yamamoto, Akihiro, Otaka, Michihiro, Yamamoto, Yuma, Yamashita, Daisuke, Yamashita, Naoto, Okumura, Takamasa, Itagaki, Naho, Koga, Kazunori, Shiratani, Masaharu
Published in MRS advances (05.12.2022)
Published in MRS advances (05.12.2022)
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Journal Article
Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition
Kamataki, Kunihiro, Sasaki, Yusuke, Nagao, Iori, Yamashita, Daisuke, Okumura, Takamasa, Yamashita, Naoto, Itagaki, Naho, Koga, Kazunori, Shiratani, Masaharu
Published in Materials science in semiconductor processing (01.09.2023)
Published in Materials science in semiconductor processing (01.09.2023)
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Journal Article