Changes in effective work function of HfxRu1-x alloy gate electrode
NABATAME, T, NUNOSHIGE, Y, KADOSHIMA, M, TAKABA, H, SEGAWA, K, KIMURA, S, SATAKE, H, OTA, H, OHISHI, T, TORIUMI, A
Published in Microelectronic engineering (01.07.2008)
Published in Microelectronic engineering (01.07.2008)
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Journal Article
The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO2 stack structure
NABATAME, T, SEGAWA, K, KADOSHIMA, M, TAKABA, H, IWAMOTO, K, KIMURA, S, NUNOSHIGE, Y, SATAKE, H, OHISHI, T, TORIUMI, Akira
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Published in Materials science in semiconductor processing (01.12.2006)
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Conference Proceeding
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Comprehensive Study of VFB Shift in High-k CMOS - Dipole Formation, Fermi-level Pinning and Oxygen Vacancy Effect
Kamimuta, Y., Iwamoto, K., Nunoshige, Y., Hirano, A., Mizubayashi, W., Watanabe, Y., Migita, S., Ogawa, A., Ota, H., Nabatame, T., Toriumi, A.
Published in 2007 IEEE International Electron Devices Meeting (01.12.2007)
Published in 2007 IEEE International Electron Devices Meeting (01.12.2007)
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Conference Proceeding
Changes in effective work function of Hf x Ru 1− x alloy gate electrode
Nabatame, T., Nunoshige, Y., Kadoshima, M., Takaba, H., Segawa, K., Kimura, S., Satake, H., Ota, H., Ohishi, T., Toriumi, A.
Published in Microelectronic engineering (2008)
Published in Microelectronic engineering (2008)
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Journal Article
The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO 2 stack structure
Nabatame, T., Segawa, K, Kadoshima, M., Takaba, H., Iwamoto, K., Kimura, S., Nunoshige, Y., Satake, H., Ohishi, T., Toriumi, Akira
Published in Materials science in semiconductor processing (2006)
Published in Materials science in semiconductor processing (2006)
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Journal Article
TWI749033B
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Year of Publication 11.12.2021
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Year of Publication 11.12.2021
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Substrate processing method and substrate processing apparatus
OKADA, MITSUHIRO, NUNOSHIGE, YU, TAKAHASHI, TSUYOSHI, KAWASAKI, SHINJI, KUWADA, HIROTAKA, TAKAGI, TOSHIO, FUJII, YASUSHI
Year of Publication 16.03.2021
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Year of Publication 16.03.2021
Patent
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
KAWASAKI SHINJI, TAKAHASHI TAKESHI, KUWADA HIROTAKA, OKADA MITSUHIRO, NUNOSHIGE YU, FUJII YASUSHI, TAKAGI TOSHIO
Year of Publication 11.12.2020
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Year of Publication 11.12.2020
Patent