Search Results - "NOLLER BASTIAN MARTEN" :: K.UTB vyhledávací portál

by SHEN DANIEL KWO HUNG, LI YUZHUO (DECEASED), FRANZ DIANA, LAN YONGQING, NOLLER BASTIAN MARTEN, RUSHING KENNETH, BAO ZHENYU, LAUTER MICHAEL
Year of Publication 22.10.2018

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CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING ORGANIC/INORGANIC COMPOSITE PARTICLES

by SHEN DANIEL KWO HUNG, GOLZARIAN REZA, LI YUZHUO, JIANG LIANG, LAN YONGQING, NOLLER BASTIAN MARTEN
Year of Publication 17.04.2017

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CMP CHEMICAL MECHANICAL POLISHING CMP COMPOSITION FOR HIGH EFFECTIVE POLISHING OF SUBSTRATES COMPRISING GERMANIUM

by SIEBERT MAX, MUENCH ALEXANDRA, HUANG KEVIN, USMAN IBRAHIM SHEIK ANSAR, SIX MANUEL, LAN YONGQING, REICHARDT ROBERT, NOLLER BASTIAN MARTEN, LAUTER MICHAEL, DANIEL GERALD
Year of Publication 12.01.2018

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CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A PROTEIN

by LI YUZHUO, LANGE ROLAND, NOLLER BASTIAN MARTEN, LAUTER MICHAEL
Year of Publication 17.10.2014

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A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR SI_1 XGEX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION HAVING A PH VALUE OF 3.0 TO 5.5

by GILLOT CHRISTOPHE, LI YUZHUO, NOLLER BASTIAN MARTEN, DRESCHER BETTINA
Year of Publication 11.06.2014

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A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR SI_1 X GE X MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND

by GILLOT CHRISTOPHE, LI YUZHUO, NOLLER BASTIAN MARTEN, DRESCHER BETTINA
Year of Publication 15.05.2014

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CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION

by SUGIHARTO ALBERT BUDIMAN, SCHMITT CHRISTINE, LI YUZHUO, DRESCHER BETTINA, NOLLER BASTIAN MARTEN
Year of Publication 06.12.2013

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SILYLATED AMINO RESINS

by BREINER THOMAS, ROESCH CHRISTINE, SCHWALM REINHOLD, STUMBE JEAN FRANCOIS, NOLLER BASTIAN MARTEN, HAAF CHRISTINA
Year of Publication 02.01.2013

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CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA

by DENGLER JOACHIM, SEYERL JOACHIM VON, USMAN IBRAHIM SHEIK ANSAR, LI YUZHUO, KRAUS ALEXANDER, LANGE ROLAND, LAN YONGQING, SIEBERT MAX, REICHARDT ROBERT, HARTNAGEL KRISTINE, NOLLER BASTIAN MARTEN, BOYKO VOLODYMYR, LAUTER MICHAEL, HILLESHEIM NINA SUSANNE
Year of Publication 30.03.2016

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AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS

by VENKATARAMAN SHYAM SUNDAR, KINGMA AREND JOUKE, SU EASON YU SHEN, NOLLER BASTIAN MARTEN
Year of Publication 22.11.2013

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A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLYMERIC POLYAMINE

by SHEN DANIEL KWO HUNG, LI YUZHUO (DECEASED), FRANZ DIANA, LAN YONGQING, NOLLER BASTIAN MARTEN, RUSHING KENNETH, BAO ZHENYU, LAUTER MICHAEL
Year of Publication 14.02.2014

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